Enhancing the electron beam sensitivity of hydrogen silsesquioxane (HSQ)

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5376, Issue PART 1, 2004, Pages 490-501

  Jeyakumar, Augustin ^a   Henderson, Clifford L ^a  

^a GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

Electron beam; Hydrogen silsesquioxane; Inorganic; Lithography; Photobase generator; Photodecomposable base; Resist; Sensitivity

Indexed keywords

ELECTRON BEAM SCANNING; PHOTOBASE GENERATORS; RESIST; SENSITIVITY;

ELECTRIC POTENTIAL; ELECTRON BEAMS; HYDROLYSIS; LITHOGRAPHY; MASKS; PROCESS CONTROL; SEMICONDUCTOR MATERIALS;

ORGANIC COMPOUNDS;

EID: 3843152634     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.536245     Document Type: Conference Paper

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