Demonstration of a directly photopatternable spin-on-glass based on hydrogen silsesquioxane and photobase generators

Macromolecules

Volumn 31, Issue 15, 1998, Pages 4798-4805

  Harkness, Brian R ^a   Takeuchi, Kasumi ^a   Tachikawa, Mamoru ^a  

^a Dow Corning Asia Ltd   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CATALYSTS; CROSSLINKING; CURING; DECOMPOSITION; HYDROLYSIS; MOLECULAR STRUCTURE; PERMITTIVITY; PHOTOCHEMICAL REACTIONS; PHOTOCONDUCTING MATERIALS; SENSITIVITY ANALYSIS; SILICONES; THERMODYNAMIC STABILITY;

HYDROGEN SILSESQUIOXANE; PHOTOBASE GENERATORS; PHOTODECOMPOSITION; PHOTOPATTERNABLE SPIN ON GLASS; PHOTOREARRANGEMENT;

PHOTOSENSITIVE GLASS;

EID: 0032114871     PISSN: 00249297     EISSN: None     Source Type: Journal    
DOI: 10.1021/ma980168t     Document Type: Article

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