HSQ hybrid lithography for 20 nm CMOS devices development

Microelectronic Engineering

Volumn 61-62, Issue , 2002, Pages 755-761

  Mollard, L ^a   Cunge, G ^b   Tedesco, S ^a   Dal'Zotto, B ^a   Foucher, J ^b  

^a CEA GRENOBLE   (France)

^b Laboratoire Interdisciplinaire de Physique   (France)

Author keywords

CAR resist; Deep UV; Electron beam; HSQ resist; Hybrid lithography

Indexed keywords

CMOS INTEGRATED CIRCUITS; ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; MASKS; SILICON WAFERS; ULTRAVIOLET RADIATION;

HYBRID LITHOGRAPHY;

PHOTORESISTS;

EID: 0036643577     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(02)00574-9     Document Type: Conference Paper

References (5)