EPL - Results and potential applications

Microelectronic Engineering

Volumn 61-62, Issue , 2002, Pages 323-329

  McCallum, M ^a   Juffermans, C A H ^b   Suzuki, K ^c   Shimizu, S ^c  

^a Nikon Precision Europe GmbH   (United Kingdom)

^b PHILIPS RESEARCH LABORATORIES   (Netherlands)

^c NIKON CORPORATION   (Japan)

Author keywords

157 nm; Contacts; CoO; e Beam; EPL

Indexed keywords

COMPUTER SIMULATION; COST EFFECTIVENESS; MICROELECTRONICS; NANOTECHNOLOGY; PHOTORESISTS;

ELECTRON PROJECTION LITHOGRAPHY (EPL);

ELECTRON BEAM LITHOGRAPHY;

EID: 0036643747     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(02)00509-9     Document Type: Conference Paper

References (6)

1. PREVAIL: IBM's e-beam technology for next generation lithography
2. PREVAIL: Development status of electron optics
3. EPL data conversion system SX-GIGA/EPLON
4. Algorithm for optimising stepper performance through image manipulation
5. Some lithographic limits of back end lithography
6. NGL and optical CoO update, Second half 1999