At-wavelength characterization of the extreme ultraviolet engineering test stand set-2 optic

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 6, 2001, Pages 2396-2400

  Naulleau, Patrick ^a   Goldberg, Kenneth A ^a   Anderson, Erik H ^a   Batson, Phillip ^a   Denham, Paul E ^a   Jackson, Keith H ^a   Gullikson, Eric M ^a   Rekawa, Senajith ^a   Bokor, Jeffrey ^a,b  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTIVE OPTICS; IMAGING TECHNIQUES; INTERFEROMETERS; INTERFEROMETRY; PROJECTION SYSTEMS; ULTRAVIOLET RADIATION; WAVEFRONTS;

ENGINEERING TEST STAND; EXTREME ULTRAVIOLET; POINT DIFFRACTION INTERFEROMETER; SPECTRAL BANDPASS CHARACTERISTICS; WAVEFRONT MEASUREMENTS;

PHOTOLITHOGRAPHY;

EID: 0035519498     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1421545     Document Type: Article

References (20)

1. R. Stulen and D. Sweeney, IEEE J. Quantum Electron. 35, 694 (1999).
2. J. H. Underwood and T. W. Barbee, Jr., Appl. Opt. 20, 3027 (1981).
3. D. Attwood, G. Sommargren, R. Beguiristain, K. Nguyen, J. Bokor, N. Ceglio, K. Jackson, M. Koike, and J. Underwood, Appl. Opt. 32, 7022 (1993).
4. J. E. Bjorkholm, A. A. MacDowell, O. R. Wood II, Z. Tan, B. LaFontaine, and D. M. Tennant, J. Vac. Sci. Technol. B 13, 2919 (1995).
5. A. K. Ray-Chaudhuri, K. D. Krenz, and C. H. Fields, J. Vac. Sci. Technol. B 15, 2462 (1997).
6. H. Medecki, E. Tejnil, K. A. Goldberg, and J. Bokor, Opt. Lett. 21, 1526 (1996).
7. K. A. Goldberg, Ph.D. dissertation, University of California, Berkeley, 1997.
8. K. A. Goldberg, P. Naulleau, P. Batson, P. Denham, E. Andersen, H. Chapman, and J. Bokor, J. Vac. Sci. Technol. B 18, 2911 (2000).
9. P. Naulleau, K. A. Goldberg, and J. Bokor, J. Vac. Sci. Technol. B 18, 2939 (2000).
10. P. Naulleau, K. Goldberg, S. Lee, C. Chang, D. Attwood, and J. Bokor, Appl. Opt. 38, 7252 (1999).
11. K. A. Goldberg, P. Naulleau, and J. Bokor, J. Vac. Sci. Technol. B 17, 2982 (1999).
12. G. F. Cardinale, C. C. Henderson, J. E. M. Goldsmith, P. J. S. Mangat, J. Cobb, and S. D. Hector, J. Vac. Sci. Technol. B 17, 2970 (1999).
13. D. Tichenor, A. Ray-Chaudhuri, W. Replogle, R. Stulen, G. Kubiak, P. Rockett, L. Klebanoff, K. Jefferson, A. Leung, J. Wronosky, L. Hale, H. Chapman, J. Taylor, J. Folta, C. Montcalm, R. Soufli, E. Spiller, K. Blaedel, G. Sommargren, D. Sweeney, P. Naulleau, K. Goldberg, E. Gulikson, J. Bokor, P. Batson, D. Attwood, K. Jackson, S. Hector, C. Gwyn, and P. Yan, Proc. SPIE 4343, 19 (2001).
14. D. W. Sweeney, R. Hudyma, H. N. Chapman, and D. Shafer, Proc. SPIE 3331, 2 (1998).
15. E. H. Anderson, V. Boegli, and L. P. Murray, J. Vac. Sci. Technol. B 13, 2529 (1995).
16. G. E. Sommargren, Extreme Ultraviolet Lithography, OSA Trends in Optics and Photonics Vol. 4, edited by G. D. Kubiak and D. R. Kania, (Optical Society of America, Washington, DC, 1996), pp. 108-112.
17. H. N. Chapman and D. W. Sweeney, Proc. SPIE 3331, 102 (1998).
18. A. Bathia and E. Wolf, Proc. Phys. Soc. London, Sect. B 65, 909 (1952).
19. E. Tenjil, K. A. Goldberg, and J. Bokor, Appl. Opt. 37, 8021 (1998).
20. P. Naulleau, K. Goldberg, E. Anderson, P. Batson, P. Denham, S. Rekawa, and J. Bokor, Proc. SPIE 4343, 639 (2001).