Lithographic evaluation of the EUV engineering test stand

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4688, Issue 1, 2002, Pages 266-276

  Lee, Sang H ^a   Tichenor, Daniel A ^b   Ballard, William P ^a   Bernardez, Luis J ^b   Goldsmith, John E M ^b   Haney, Steven J ^b   Jefferson, Karen L ^b   Johnson, Terry A ^b   Leung, Alvin H ^b   O'Connell, Donna J ^b   Replogle, William C ^b   Wronosky, John B ^b   Blaedel, Kenneth ^c   Naulleau, Patrick ^d   Goldberg, Kenneth A ^d   Gullikson, Eric M ^d   Chapman, Henry N ^d   Wurm, Stefan ^e   Panning, Eric ^a   Yan, Pei Yang ^a   Zhang, Goujing ^a   Bjorkholm, John E ^a   Kubiak, Glenn D ^b   Sweeney, Donald W ^c   Attwood, David ^d   Gwyn, Charles W ^a   more..

^a INTEL CORPORATION   (United States)

^b SANDIA NATIONAL LABORATORIES   (United States)

^c LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

^d LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^e INFINEON TECHNOLOGIES   (United States)

Author keywords

Aerial image contrast; Extreme ultraviolet; Flare; Laser produced plasma; Lithography; Resist resolution

Indexed keywords

COMPUTER SIMULATION; IMAGE QUALITY; LASER PRODUCED PLASMAS; OPTICAL RESOLVING POWER; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL);

LITHOGRAPHY;

EID: 0141620987     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.472300     Document Type: Article

References (11)

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