High-power, laser-produced-plasma EUV source

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4688, Issue 1, 2002, Pages 302-309

  Ballard, William P ^a   Bernardez, Luis J ^a   Lafon, Robert E ^a   Anderson, Richard J ^a   Perras, Yon ^a   Leung, Alvin ^a   Shields, Harry ^b   Petach, Michael B ^b   St Pierre, Randall J ^c   Bristol, Robert ^d  

^a SANDIA NATIONAL LABORATORIES   (United States)

^b NORTHROP GRUMMAN CORPORATION   (United States)

^c Cutting Edge Optronics   (United States)

^d INTEL CORPORATION   (United States)

Author keywords

EUVL; Laser plasma source; Laser produced plasma; Lithography

Indexed keywords

MULTILAYERS; NEODYMIUM LASERS; PHOTOLITHOGRAPHY; ULTRAVIOLET RADIATION; XENON;

LASER PLASMA SOURCE;

LASER PRODUCED PLASMAS;

EID: 0012083353     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.472303     Document Type: Article

References (13)

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