Ferroelectric PbTiO3 films grown by pulsed liquid injection metalorganic chemical vapour deposition

Ferroelectrics

Volumn 353, Issue 1 PART 3, 2007, Pages 104-115

  Bartasyte, A ^a,b   Abrutis, A ^a   Jimenez, C ^b   Weiss, F ^b   Chaix Pluchery, O ^b   Saltyte, Z ^a  

^a VILNIUS UNIVERSITY   (Lithuania)

^b MINATEC   (France)

Author keywords

Liquid injection MOCVD; PbTiO3 films; Twinning

Indexed keywords

DEPOSITION CONDITIONS; DEPOSITION TEMPERATURES; FILM COMPOSITION; LIQUID INJECTION MOCVD; LIQUID INJECTIONS; METALORGANIC CHEMICAL VAPOUR DEPOSITION; MOCVD; PARTIAL OXYGEN PRESSURES; PBTIO3 FILMS; PEROVSKITE SUBSTRATES; POLYCRYSTALLINE; SOLUTION COMPOSITION; SRTIO; TETRAMETHYL;

CHEMICAL VAPOR DEPOSITION; DEPOSITION; DIELECTRIC MATERIALS; DISSOLUTION; EPITAXIAL GROWTH; FERROELECTRIC FILMS; FERROELECTRICITY; LANTHANUM ALLOYS; LEAD; LIQUIDS; MICROSTRUCTURE; OXIDE MINERALS; OXYGEN; PEROVSKITE; RAMAN SPECTROSCOPY; SAPPHIRE; STRONTIUM ALLOYS; SUBSTRATES; TOLUENE; X RAY DIFFRACTION;

EPITAXIAL FILMS;

EID: 38149003855     PISSN: 00150193     EISSN: 15635112     Source Type: Journal    
DOI: 10.1080/00150190701368059     Document Type: Conference Paper

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