Plasma-enhanced chemical vapor deposition of PbTiO3 thin films

Materials Letters

Volumn 46, Issue 2-3, 2000, Pages 60-64

  Tong, Maosong ^a   Dai, Guorui ^a   Gao, Dingsan ^a  

^a JILIN UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION EFFECTS; FERROELECTRIC MATERIALS; LEAD COMPOUNDS; MORPHOLOGY; OXYGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY; SILICON; SUBSTRATES; THIN FILMS; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

X RAY FLUORESCENCE SPECTROSCOPY (X-FS);

DIELECTRIC MATERIALS;

EID: 0034317026     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-577X(00)00143-9     Document Type: Article

References (8)

1. Okuyama M., Matsui Y., Nakano H., Hamakawa Y. Ferroelectrics. 33:1981;235.
2. Okuyama M., Seto H., Kojima M., Matsui Y., Hamakawa Y. Jpn. J. Appl. Phys., Suppl. 21-1:1982;225.
3. Hirashima H., Onishi E., Nakagawa M. J. Non-Cryst. Solids. 121:1990;404.
4. Okuyama M., Hamakawa Y. Ferroelectrics. 118:1991;261.
5. Okuyama M., Hamakawa Y. Ferroelectrics. 63:1985;243.
6. Kojma M., Okuyama M., Nakagawa T., Hamakawa Y. Jpn. J. Appl. Phys., Suppl. 22-2:1983;14.
7. Dai G. Sens. Actuators, B. 53:1998;8.
8. Mukherjee S., Evans P. Thin Solid Films. 14:1972;105.