Comparison of deposition behavior of Pb(Zr,Ti)O3 films and its end-member-oxide films prepared by MOCVD

Thin Solid Films

Volumn 368, Issue 2, 2000, Pages 261-265

  Funakubo, Hiroshi ^a   Nagashima, Kuniharu ^a   Shinozaki, Kazuo ^b   Mizutani, Nobuyasu ^b  

^a Interdisc Grad Sch Sci Eng   (Japan)

^b TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION EFFECTS; ENERGY DISPERSIVE SPECTROSCOPY; FILM PREPARATION; METALLORGANIC CHEMICAL VAPOR DEPOSITION; OXIDES; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; THERMAL EFFECTS;

COMPOSITION CONTROL; DEPOSITION RATE; OXIDE FILMS;

THIN FILMS;

EID: 0033688313     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)00778-1     Document Type: Article

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