Etching of nanopatterns in silicon using nanopantography

Applied Physics Letters

Volumn 92, Issue 1, 2008, Pages

  Xu, Lin ^a   Nasrullah, Azeem ^a   Chen, Zhiying ^a   Jain, Manish ^a   Ruchhoeft, Paul ^a   Economou, Demetre J ^a   Donnelly, Vincent M ^a  

^a UNIVERSITY OF HOUSTON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROSTATIC LENSES; ETCHING; FOCUSED ION BEAMS; PANTOGRAPHS; SILICON COMPOUNDS; SILICON WAFERS; TRENCHING;

ETCHING OF NANOPATTERNS; ION BEAM IMPINGES; ION FOCI;

NANOSTRUCTURED MATERIALS;

EID: 38049027203     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2828208     Document Type: Article

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