Nanopantography: A new method for massively parallel nanopatterning over large areas

Nano Letters

Volumn 5, Issue 12, 2005, Pages 2563-2568

  Xu, Lin ^a   Vemula, Sri C ^b   Jain, Manish ^a   Nam, Sang Ki ^a   Donnelly, Vincent M ^a   Economou, Demetre J ^a   Ruchhoeft, Paul ^b  

^a University of Houston   (United States)

^b UNIVERSITY OF HOUSTON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BROAD-AREA COLLIMATED BEAM OF IONS; ION-FOCUSING MICROLENSES; NANOMETER-SCALE PRESELECTED PATTERNS; NANOPANTOGRAPHY;

LITHOGRAPHY; REACTIVE ION ETCHING; SILICON WAFERS; SUBSTRATES; THIN FILMS;

NANOTECHNOLOGY;

NANOMATERIAL; SILICON;

ARTICLE; CHEMISTRY; CONFORMATION; CRYSTALLIZATION; ELECTROCHEMISTRY; METHODOLOGY; NANOTECHNOLOGY; SURFACE PROPERTY; ULTRASTRUCTURE;

CRYSTALLIZATION; ELECTROCHEMISTRY; MOLECULAR CONFORMATION; NANOSTRUCTURES; NANOTECHNOLOGY; SILICON; SURFACE PROPERTIES;

EID: 30644467120     PISSN: 15306984     EISSN: None     Source Type: Journal    
DOI: 10.1021/nl051976i     Document Type: Article

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