PREVAIL-Electron projection technology approach for next-generation lithography

IBM Journal of Research and Development

Volumn 45, Issue 5, 2001, Pages 615-636

  Dhaliwal, R S ^a   Enichen, W A ^a   Golladay, S D ^a   Gordon, M S ^a   Kendall, R A ^a   Lieberman, J E ^a   Preiffer, H C ^a   Pinckney, D J ^a   Robinson, C F ^a   Rockrohr, J D ^a   Stickel, W ^a   Tressler, E V ^a  

^a IBM MICROELECTRONICS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABERRATIONS; ELECTRON EMISSION; ELECTRON SOURCES; LENSES; OPTICS; PHOTOLITHOGRAPHY; PROJECTION SYSTEMS; SCANNING; VACUUM TECHNOLOGY;

ALPHA SYSTEM; CURVILINEAR VARIABLE AXIS LENS; ELECTRON OPTICAL METHOD; ELECTRON PROJECTION TECHNOLOGY; PARALLEL PIXEL PROJECTION; PROOF-OF-CONCEPT SYSTEM; SCANNING-PROBE-FORMING SYSTEM;

ELECTRON BEAM LITHOGRAPHY;

EID: 0035465562     PISSN: 00188646     EISSN: None     Source Type: Journal    
DOI: 10.1147/rd.455.0615     Document Type: Article

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