Si(100) etching by translational energy controlled atomic chlorine beams

Journal of Applied Physics

Volumn 79, Issue 8, 1996, Pages 4397-4401

  Teraoka, Yuden ^a   Nishiyama, Iwao ^a  

^a NEC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0004704328     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.362671     Document Type: Article

References (24)

1. S. Murakawa and J. P. McVittie, Jpn. J. Appl. Phys. 33, 2184 (1994).
2. F. Shimokawa, H. Tanaka, Y. Uenishi, and R. Sawada, J. Appl. Phys. 66, 2613 (1989); F. Shimokawa, J. Vac. Sci. Technol. A 10, 1352 (1992).
3. F. Shimokawa, H. Tanaka, Y. Uenishi, and R. Sawada, J. Appl. Phys. 66, 2613 (1989); F. Shimokawa, J. Vac. Sci. Technol. A 10, 1352 (1992).
4. T. Mizutani and S. Nishimatsu, J. Vac. Sci. Technol. A 6, 1417 (1988); J. Vac. Sci. Technol. B 7, 547 (1989); T. Mizutani, Jpn. J. Appl. Phys. 30, L628 (1991); K. Yokogawa, Y. Yajima, T. Mizutani, S. Nishimatsu, and K. Ninomiya, ibid. 30, 3199 (1991).
5. T. Mizutani and S. Nishimatsu, J. Vac. Sci. Technol. A 6, 1417 (1988); J. Vac. Sci. Technol. B 7, 547 (1989); T. Mizutani, Jpn. J. Appl. Phys. 30, L628 (1991); K. Yokogawa, Y. Yajima, T. Mizutani, S. Nishimatsu, and K. Ninomiya, ibid. 30, 3199 (1991).
6. T. Mizutani and S. Nishimatsu, J. Vac. Sci. Technol. A 6, 1417 (1988); J. Vac. Sci. Technol. B 7, 547 (1989); T. Mizutani, Jpn. J. Appl. Phys. 30, L628 (1991); K. Yokogawa, Y. Yajima, T. Mizutani, S. Nishimatsu, and K. Ninomiya, ibid. 30, 3199 (1991).
7. T. Mizutani and S. Nishimatsu, J. Vac. Sci. Technol. A 6, 1417 (1988); J. Vac. Sci. Technol. B 7, 547 (1989); T. Mizutani, Jpn. J. Appl. Phys. 30, L628 (1991); K. Yokogawa, Y. Yajima, T. Mizutani, S. Nishimatsu, and K. Ninomiya, ibid. 30, 3199 (1991).
8. Y. Teraoka and I. Nishiyama, Appl. Phys. Lett. 63, 3355 (1993).
9. Y. Teraoka and I. Nishiyama, Jpn. J. Appl. Phys. 33, 2240 (1994).
10. K. Karahashi, J. Matsuo, and S. Hijiya, Appl. Surf. Sci. 60/61, 126 (1992).
11. F. Campos, G. C. Weaver, C. J. Waltman, and S. R. Leone, J. Vac. Sci. Technol. B 10, 2217 (1992).
12. H. Feil (private communication).
13. A. Szabo and T. Engel, J. Vac. Sci. Technol. A 12, 648 (1994).
14. A. Szabo, P. D. Farrall, and T. Engel, J. Appl. Phys. 75, 3623 (1994).
15. K. Karahashi, J. Matsuo, and K. Horiuchi, Jpn. J. Appl. Phys. 33, 2252 (1994).
16. J. B. Anderson, R. P. Andres, and J. B. Fenn, in Molecular Beams, edited by J. Ross (Wiley, New York, 1966), p. 275.
17. Y. Teraoka and I. Nishiyama, J. Appl. Phys. (submitted).
18. A. Szabo, P. D. Farrall, and T. Engel, Surf. Sci. 312, 284 (1994).
19. Q. Gao, C. C. Cheng, P. J. Chen, W. J. Choyke, and J. T. Yates, Jr., J. Chem. Phys. 98, 8308 (1993).
20. J. Matsuo, K. Karahashi, A. Sato, and S. Hijiya, Jpn. J. Appl. Phys. 31, 2025 (1992).
21. N. Aoto, E. Ikawa, and Y. Kurogi, Surf. Sci. 199, 408 (1988).
22. T. Ohno, Phys. Rev. Lett. 70, 962 (1993).
23. L. S. O. Johansson, R. I. G. Uhrberg, R. Lindsay, P. L. Wincott, and G. Thornton, Phys. Rev. B 42, 9534 (1990).
24. D. Purdie, N. S. Prakash, K. G. Purcell, P. L. Wincott, and G. Thornton, Phys. Rev. B 48, 2275 (1993).