Silicon etch in the presence of a fluorocarbon overlayer: The role of fluorocarbon cluster ejection

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 26, Issue 1, 2008, Pages 52-61

  Végh, Joseph J ^a   Humbird, David ^a,b   Graves, David B ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b LAM RESEARCH CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FLUOROCARBON CLUSTER EJECTION; PLASMA CHEMISTRY; STICKING PROBABILITY;

FILM GROWTH; MOLECULAR DYNAMICS; MOLECULAR MODELING; PLASMA APPLICATIONS; PLASMA ETCHING; SILICON;

FLUOROCARBONS;

EID: 37849010381     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2812444     Document Type: Article

References (31)

1. International Technology Roadmap for Semiconductors, 2006 update.
2. G. S. Oehrlein, Mater. Sci. Eng., B MSBTEK 0921-5107 10.1016/0921- 5107(89)90284-5 B4, 441 (1989).
3. J. J. V́gh, D. Humbird, and D. B. Graves, J. Vac. Sci. Technol. A JVTAD6 0734-2101 10.1116/1.2049304 23, 1598 (2005).
4. C. Cardinaud, G. Turban, B. Grolleau, J. P. Grandchamp, C. Lejeune, P. Scheiblin, and E. Collard, Appl. Surf. Sci. ASUSEE 0169-4332 10.1016/0169-4332(89)90927-6 36, 322 (1989).
5. H. P. Strunk, H. Cerva, and E. G. Mohr, J. Electrochem. Soc. JESOAN 0013-4651 10.1149/1.2095452 135, 2876 (1988).
6. D. J. Vitkavage and T. M. Mayer, J. Vac. Sci. Technol. B JVTBD9 0734-211X 10.1116/1.583507 4, 1283 (1986).
7. G. S. Oehrlein, G. J. Coyle, J. G. Clabes, and Y. H. Lee, Surf. Interface Anal. SIANDQ 0142-2421 10.1002/sia.740090503 9, 275 (1986).
8. G. J. Coyle and G. S. Oehrlein, Appl. Surf. Sci. ASUSEE 0169-4332 10.1016/0169-4332(86)90085-1 25, 423 (1986).
9. G. J. Coyle and G. S. Oehrlein, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.96086 47, 604 (1985).
10. E. Stoffels, W. W. Stoffels, and K. Tachibana, Rev. Sci. Instrum. RSINAK 0034-6748 10.1063/1.1148486 69, 116 (1998).
11. W. W. Stoffels, E. Stoffels, and K. Tachibana, J. Vac. Sci. Technol. A JVTAD6 0734-2101 10.1116/1.581016 16, 87 (1998).
12. A. Bogaerts, K. De Bleecker, I. Kolev, and M. Madani, Surf. Coat. Technol. SCTEEJ 0257-8972 200, 62 (2005).
13. D. Humbird and D. B. Graves, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.1736321 96, 65 (2004).
14. D. Humbird and D. B. Graves, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.1769602 96, 2466 (2004).
15. C. F. Abrams and D. B. Graves, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.371637 86, 5938 (1999).
16. J. Tanaka, C. F. Abrams, and D. B. Graves, J. Vac. Sci. Technol. A JVTAD6 0734-2101 10.1116/1.582279 18, 938 (2000).
17. D. Humbird and D. B. Graves, J. Chem. Phys. JCPSA6 0021-9606 10.1063/1.1636722 120, 2405 (2004).
18. D. Humbird, " Computational studies of plasma-surface interactions.," Ph.D. thesis, University of California, Berkeley, 2004.
19. D. Humbird and D. B. Graves, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.1753657 96, 791 (2004).
20. H. J. C. Berendsen, J. P. M. Postma, W. F. van Gunsteren, A. DiNola, and J. R. Haak, J. Chem. Phys. JCPSA6 0021-9606 10.1063/1.448118 81, 3684 (1984).
21. W. C. Swope, H. C. Andersen, P. H. Berens, and K. R. Wilson, J. Chem. Phys. JCPSA6 0021-9606 10.1063/1.442716 76, 637 (1982).
22. I. Torrens, Interatomic Potentials (Academic, New York, 1972).
23. C. F. Abrams and D. B. Graves, Thin Solid Films THSFAP 0040-6090 10.1016/S0040-6090(00)01145-7 374, 150 (2000).
24. N. M. Mackie, V. A. Venturo, and E. R. Fisher, J. Phys. Chem. B JPCBFK 1089-5647 10.1021/jp972434v 101, 9425 (1997).
25. G. Cunge and J. P. Booth, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.370296 85, 3952 (1999).
26. Y. Kimura, J. W. Coburn, and D. B. Graves, J. Vac. Sci. Technol. A JVTAD6 0734-2101 10.1116/1.1810166 22, 2508 (2004).
27. M. W. Thompson, Philos. Mag. PHMAA4 0031-8086 10.1080/14786436808227358 18, 377 (1968).
28. M. E. Barone and D. B. Graves, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.358928 77, 1263 (1995).
29. J. W. Coburn and E. Kay, IBM J. Res. Dev. IBMJAE 0018-8646 23, 33 (1979).
30. T. E. F. M. Standaert, C. Hedlund, E. A. Joseph, G. S. Oehrlein, and T. J. Dalton, J. Vac. Sci. Technol. A JVTAD6 0734-2101 10.1116/1.1626642 22, 53 (2004).
31. X. Li, X. F. Hua, L. Ling, G. S. Oehrlein, M. Barela, and H. M. Anderson, J. Vac. Sci. Technol. A JVTAD6 0734-2101 10.1116/1.1517256 20, 2052 (2002).