New C-F interatomic potential for molecular dynamics simulation of fluorocarbon film formation

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 3, 2000, Pages 938-945

  Tanaka, J ^a   Abrams, C F ^b   Graves, D B ^b  

^a HITACHI LTD   (Japan)

^b University of California   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; ARGON; ATOMIZATION; CHEMICAL BONDS; COMPUTER SIMULATION; ETCHING; FILM GROWTH; FUNCTIONS; ION BOMBARDMENT; MOLECULAR DYNAMICS; MOLECULAR STRUCTURE; SPUTTERING;

INTERATOMIC POTENTIAL; ION SPUTTERING; TERSOFF-BRENNER POTENTIAL;

FLUOROCARBONS;

EID: 0034187093     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.582279     Document Type: Article

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