Vacuum beam studies of fluorocarbon radicals and argon ions on Si and SiO 2 surfaces

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 22, Issue 6, 2004, Pages 2508-2516

  Kimura, Yoshie ^a   Coburn, J W ^a   Graves, David B ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FLUOROCARBON PLASMAS; HEAVIER PRECURSORS; HEAVIER SPECIES; THIN FILM DEPOSITION;

ADSORPTION; ARGON; DEPOSITION; DISSOCIATION; ETCHING; ION BOMBARDMENT; PROBABILITY; SEMICONDUCTOR MATERIALS; SILICA; SILICON; THIN FILMS;

FLUOROCARBONS;

EID: 10244279214     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1810166     Document Type: Article

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