Estimation of diffusion lengths of acid and quencher in chemically amplified resist on the basis of extreme ultraviolet exposure results

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 25, Issue 6, 2007, Pages 2114-2117

  Tanaka, Yuusuke ^a,b   Kikuchi, Yukiko ^a   Goo, Doohoon ^a   Oizumi, Hiroaki ^a,b   Nishiyama, Iwao ^a,b  

^a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

^b SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EXTREME ULTRAVIOLET MICROEXPOSURE; QUENCHER DIFFUSION;

COMPUTER SIMULATION; DIFFUSION IN LIQUIDS; MATHEMATICAL MODELS; QUENCHING;

EXTREME ULTRAVIOLET LITHOGRAPHY;

EID: 37149003657     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2787867     Document Type: Article

References (13)

1. P. P. Naulleau, Appl. Opt. 43, 788 (2004).
2. G. M. Schmid, M. D. Stewart, C. Wang, B. D. Vogt, V. M. Prabhu, E. K. Lin, and C. G. Willson, Proc. SPIE 5376, 333 (2004).
3. Y. Tanaka, Y. Kikuchi, D. Goo, and I. Nishiyama, Proc. SPIE 6517, 65172L (2007).
4. T. Brunner, C. Fonseca, N. Seong, and M. Burkhardt, Proc. SPIE 5377, 141 (2004).
5. J. P. Cain, P. Naulleau, and C. J. Spanos, Proc. SPIE 5751, 1101 (2005).
6. H. Fukuda, K. Hattori, and T. Hagiwara, Proc. SPIE 4346, 319 (2001).
7. Y. Iba, F. Kumasaka, T. Iizuka, and M. Yamabe, Jpn. J. Appl. Phys., Part 1 39, 5329 (2000).
8. Y. Tanaka, D. Kim, H. Yamanashi, and I. Nishiyama, Proc. SPIE 5374, 281 (2004).
9. T. Abe, A. Fujii, H. Mohri, N. Hayashi, Y. Tanaka, and I. Nishiyama, Proc. SPIE 6283, 62830H (2006).
10. P. P. Naulleau, K. A. Goldberg, E. Anderson, J. P. Cain, P. Denham, K. Jackson, A. Morlens, S. Rekawa, and F. Salmassi, J. Vac. Sci. Technol. B 22, 2962 (2004).
11. P. Naulleau, K. A. Goldberg, E. Anderson, K. Bradley, R. Delano, P. Denham, B. Gunion, B. Harteneck, B. Hoef, H. Huang, K. Jackson, G. Jones, D. Kemp, J. A. Liddle, R. Oort, A. Rawlins, S. Rekawa, F. Salmassi, R. Tackaberry, C. Chung, L. Hale, D. Phillion, G. Sommargren, and J. Taylor, Proc. SPIE 5374, 881 (2004).
12. K. A. Goldberg, P. Naulleau, P. Denham, S. B. Rekawa, K. Jackson, J. A. Liddle, and E. H. Anderson, Proc. SPIE 5374, 64 (2004).
13. T. Köhler, R. L. Brainard, P. P. Naulleau, D. V. Steenwinckel, J. H. Lammers, K. A. Goldberg, J. F. Mackevich, and P. Trefonas, Proc. SPIE 5753, 754 (2005).