Fundamental properties of fluoroalcohol-methacrylate polymers for use in 193nm lithography

Journal of Photopolymer Science and Technology

Volumn 19, Issue 5, 2006, Pages 569-572

  Allen, R D ^a   Breyta, G ^a   Brock, P ^a   DiPietro, R ^a   Sanders, D ^a   Sooriyakumaran, R ^a   Sundberg, L K ^a  

^a IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

193nm photoresists; Hexafluoroalcohol; Immersion lithography; Methacrylate polymers; Topcoats

Indexed keywords

EID: 33748577301     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.19.569     Document Type: Article

References (5)

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