Positive resists based on non-polymeric macromolecules

Journal of Photopolymer Science and Technology

Volumn 18, Issue 3, 2005, Pages 425-429

  Sooriyakumaran, Ratnam ^a   Truong, Hoa ^a   Sundberg, Linda ^a   Morris, Mark ^a   Hinsberg, Bill ^a   Ito, Hiroshi ^a   Alien, Robert ^a   Huang, Wu Song ^b   Goldfarb, Dario ^c   Burns, Sean ^c   Pfeiffer, Dirk ^c  

^a IBM ALMADEN RESEARCH CENTER   (United States)

^b IBM MICROELECTRONICS   (United States)

^c IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

193 nm lithography; Chemically amplified resists; Molecular resists; Non polymeric; Oligosaccharides; Silsesquioxanes

Indexed keywords

EID: 22144468403     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.18.425     Document Type: Article

References (10)

1. T.Kadota, M. Yoshiiwa, F. Wakaya, K. Gamo, and Y. Shirota, Proc. SPIE, 4345 (2001) 891.
2. T. Yoshimura, J. Yamamoto, H. Shiraoishi, S. Uchino, T. Terasawa, F. Murai, and S. Okasaki, J. Photopolym. Sci. Technol., 10 (4) (1997) 629.
3. J. Fujita, Y Ohnishi, Y. Ochiai, E. Nomura, and S. Matsui, J. Vac. Sci. Technol., B 14 (6) (1996) 4272.
4. For example, M. Yoshiiwa, H. Kageyama, Y. Shirota, F. Wakaya, K. Gamo, M. Takai, Appl. Phys. Lett., 69 (17) (1996) 2605.
5. th Intl. Conf. on Photopolymers, SPE. (2000) 219.
6. J. B. Kim, Y G. Kwon, H. J. Yun, J. H. Choi, Proc. SPIE, 4690 (2002) 837.
7. G. M. Wallraff et. al., Proc. SPIE, 5753 (2005), In Press.
8. R. Sooriyakumaran et. al., Proc. SPIE, 5753 (2005), In Press.
9. I. Ojima in The Chemistry of Organosilicon Compounds, S. Patai, Z. Rappoport, Eds., Wiley: Chichester, 1989; Vol.2, Chapter 25.
10. W. Hinsberg G. Wallraff, C. Larson, B. Davis, V. Deline, S. Raoux, D. Miller, F. Houle, J. Hoffnagle, M. Sanchez, C, Rettner, L. Sundberg, D. Medeiros, R. Dammel, and W. Conley, Proc. SPIE, 5376 (2004) 21.