The Micro to Nano Addressing Block (MNAB)

Technical Digest - International Electron Devices Meeting, IEDM

Volumn 2005, Issue , 2005, Pages 471-474

  Gopalakrishnan, K ^a   Shenoy, R S ^a   Rettner, C T ^a   King, R S ^a   Zhang, Y ^b   Kurdi, B ^a   Bozano, L D ^a   Welser, J J ^a   Rothwell, M E ^b   Jurich, M ^a   Sanchez, M I ^a   Hernandez, M ^a   Rice, P M ^a   Risk, W P ^a   Wickramasinghe, H K ^a  

^a IBM ALMADEN RESEARCH CENTER   (United States)

^b IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 33846790409     PISSN: 01631918     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)

1. C. T. Black and O. Bezencenet, "Nanometer-scale pattern registration and alignment by directed diblock copolymer self-assembly," IEEE Trans. on Nanotechnology, pp. 412-5, Sept 2004.
2. S. Y. Chou, P. R. Krauss, and P. J. Renstrom, "Imprint lithography with 25-nanometer resolution," Science, vol. 272, pp. 85-7, April 1996.
3. Y.-K. Choi , J. S. Lee, J. Zhu, G. A. Somorjai, L. P. Lee, and J. Bokor, "Sublithographic nanofabrication technology for nanocatalysts and DNA chips," J. Vac. Sci. Technol., B 21(6), pp.2951-5, 2003.
4. A. DeHon, P. Lincoln and J. E. Savage, "Stochastic assembly of sublithographic nanoscale interfaces," IEEE Trans. on Nanotechnology, pp. 165-174, Sept. 2003.
5. S. Williams and P. Kuekes, "Demultiplexer for a molecular wire crossbar network," US Patent 6256767, July 3 2001.