Defect studies for the development of nano-scale silicon diffusion simulators

Physica B: Condensed Matter

Volumn 401-402, Issue , 2007, Pages 511-518

  Uematsu, Masashi ^a   Shimizu, Yasuo ^a   Itoh, K M ^a  

^a KEIO UNIVERSITY   (Japan)

Author keywords

Defects; Diffusion; Interface; Nano process; Silicon; Silicon oxide; Simulation

Indexed keywords

DIFFUSION IN SOLIDS; HETEROJUNCTIONS; IMPURITIES; SEMICONDUCTOR DEVICES;

DEFECT INTERACTIONS; EXTRINSIC DEFECTS; NANO-SCALE DEVICE;

SILICON COMPOUNDS;

EID: 36048988448     PISSN: 09214526     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.physb.2007.09.011     Document Type: Article

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