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Volumn 6519, Issue PART 2, 2007, Pages

Evaluation of the 3D compositional heterogeneity effect on line-edge-roughness

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL COMPOSITION FLUCTUATION; DEPROTECTION GRADIENT;

EID: 35148867127     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.712682     Document Type: Conference Paper
Times cited : (3)

References (23)
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  • 2
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    • Deep-ultraviolet interferometric lithography as a tool for assessment of chemically amplified photoresist performance
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    • (1998) J Vac Sci Techn B , vol.16 , pp. 3689-3694
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  • 4
    • 0035519476 scopus 로고    scopus 로고
    • Resist line edge roughness and aerial image contrast
    • Shin, J.; Han, G.; Ma, Y.; Moloni, K.; Cerrina, F. Resist line edge roughness and aerial image contrast. J Vac Sci Techn B 2001, 19 (6), 2890-2895.
    • (2001) J Vac Sci Techn B , vol.19 , Issue.6 , pp. 2890-2895
    • Shin, J.1    Han, G.2    Ma, Y.3    Moloni, K.4    Cerrina, F.5
  • 5
    • 24644487409 scopus 로고    scopus 로고
    • Factors contributing to sidewall roughness in a positive-tone, chemically amplified resist exposed by x-ray lithography
    • Reynolds, G. W.; Taylor, J. W. Factors contributing to sidewall roughness in a positive-tone, chemically amplified resist exposed by x-ray lithography. J Vac Sci Techn B 1999, 17 (2), 334-344.
    • (1999) J Vac Sci Techn B , vol.17 , Issue.2 , pp. 334-344
    • Reynolds, G.W.1    Taylor, J.W.2
  • 6
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    • Depth dependence of resist line-edge-roughness:relation to photoacid diffusion length
    • Shin, J.; Ma, Y.; Cerrina, F. Depth dependence of resist line-edge-roughness:relation to photoacid diffusion length. J Vac Sci Techn B 2002, 20 (6), 2927-2931.
    • (2002) J Vac Sci Techn B , vol.20 , Issue.6 , pp. 2927-2931
    • Shin, J.1    Ma, Y.2    Cerrina, F.3
  • 7
    • 0037159289 scopus 로고    scopus 로고
    • Kinetics model for positive tone resist dissolution and roughening
    • Houle, F. A.; Hinsberg, W. D.; Sanchez, M. I. Kinetics model for positive tone resist dissolution and roughening. Macromolecules 2002, 35, 8591-8600.
    • (2002) Macromolecules , vol.35 , pp. 8591-8600
    • Houle, F.A.1    Hinsberg, W.D.2    Sanchez, M.I.3
  • 8
    • 2342513468 scopus 로고    scopus 로고
    • Acid-base reactions in a positive tone chemically amplified photoresist and their effect on imaging
    • Houle, F. A.; Hinsberg, W. D.; Sanchez, M. I. Acid-base reactions in a positive tone chemically amplified photoresist and their effect on imaging. Journal of Vacuum Science & Technology B 2004, 22 (2), 747-757.
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    • Houle, F.A.1    Hinsberg, W.D.2    Sanchez, M.I.3
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    • Effect of copolymer composition on acid-catalyzed deprotection reaction kinetics in model photoresists
    • Kang, S.; Prabhu, V. M.; Vogt, B. D.; Lin, E. K.; Wu, W. L.; Turnquest, K. Effect of copolymer composition on acid-catalyzed deprotection reaction kinetics in model photoresists. Polymer 2006, 47, 6293-6302.
    • (2006) Polymer , vol.47 , pp. 6293-6302
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.