Mechanistic model of line edge roughness

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6153 I, Issue , 2006, Pages

  Smith, Mark D ^a  

^a KLA Tencor Austin   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FEATURE SIZES; LINE-EDGE ROUGHNESS (LER); MECHANISTIC MODEL; PROLITH CONTINUUM MODEL;

CALIBRATION; PHOTOLITHOGRAPHY; PHOTORESISTS; PROBABILITY DISTRIBUTIONS; ROBUSTNESS (CONTROL SYSTEMS); SHOT NOISE; THERMAL DIFFUSION; WSI CIRCUITS;

SURFACE ROUGHNESS;

EID: 33745593771     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.659627     Document Type: Conference Paper

References (8)

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2. T.B. Michaelson, A.R. Pawloski, A. Acheta, Y. Nishimura, C.G. Willson, "The effects of chemical gradients and photoresist composition on lithographically generated line edge roughness" Proc. SPIE, 5753, 368-379 (2005).
3. P. Nikolsky, R. Tweg, E. Altshuler, E.N. Shauly, "LER characterization and impact on 0.13-μm lithography for OPC modeling" Proc. SPIE, 1323-1331 (2004).
4. G. Gallatin, "Resist blur and line edge roughness" Proc. SPIE, 5754, 38-52 (2005).
5. Private communication.
6. W.D. Hinsberg, F.A. Houle, M.I. Sanchez, J.A. Hoffnagle, G.M. Wallraff, D.R. Medeiros, G.M. Gallatin, J.L. Cobb, "Extendibility of chemically amplified resists: another brick wall?", Proc. SPIE, 5039, 1-14 (2003).
7. th Edition, Springer 2002.
8. J. Byers, C.A. Mack, M.D. Smith, "Defining process windows for line-edge roughness and pattern collapse" SPIE 2005 (unpublished).