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Volumn 36, Issue 7 SUPPL. B, 1997, Pages 4838-4844
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A method for identifying sources of reactive ion etch lag and loading in a magnetically enhanced reactive ion etcher
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Author keywords
Loading; MERIE; Polymerization; RIE lag; SiO2 etching
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Indexed keywords
MAGNETIC FIELD EFFECTS;
MATHEMATICAL MODELS;
PLASMA ETCHING;
POLYMERIZATION;
REACTIVE ION ETCHING;
SILICA;
STATISTICAL METHODS;
TRANSPORT PROPERTIES;
MAGNETICALLY ENHANCED REACTIVE ION ETCHER (MERIE);
PLASMA SOURCES;
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EID: 0031176681
PISSN: 00214922
EISSN: None
Source Type: Journal
DOI: 10.1143/jjap.36.4838 Document Type: Article |
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Times cited : (15)
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References (6)
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