Mass spectrometry study during the vapor deposition of poly-para-xylylene thin films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 5, 2000, Pages 2459-2465

  Fortin, J B ^a,b   Lu, T M ^a,c  

^a RENSSELAER POLYTECHNIC INSTITUTE   (United States)

^b Engineering Science Program   (United States)

^c Department of Physics Applied Physics and Astronomy

Author keywords

[No Author keywords available]

Indexed keywords

DIFFERENTIALLY PUMPED QUADRUPOLE MASS SPECTROMETER; POLY-PARA-XYLYLENE;

ACETONE; CONTAMINATION; DIMERS; FURNACES; MASS SPECTROMETRY; MONOMERS; PARTIAL PRESSURE; PYROLYSIS; VAPOR DEPOSITION; XYLENE;

THIN FILMS;

EID: 0034276294     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1289773     Document Type: Article

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