Pressure dependent Parylene-N pore sealant penetration in porous low- κ dielectrics

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 23, Issue 5, 2005, Pages 2232-2235

  Juneja, Jasbir S ^a   Eyck, Gregory A Ten ^a   Bakhru, H ^b   Lu, T M ^a  

^a RENSSELAER POLYTECHNIC INSTITUTE   (United States)

^b STATE UNIVERSITY OF NEW YORK   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION RATE; NUCLEAR REACTION ANALYSIS (NRA); PARYLENE;

CHEMICAL VAPOR DEPOSITION; DEPOSITION; PERMITTIVITY; POROSITY; SEALANTS;

DIELECTRIC MATERIALS;

EID: 31144463524     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2040427     Document Type: Conference Paper

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