The synergistic effect of N2/H2 gases in the plasma passivation of siloxane-based low-k polymer films

Electrochemical and Solid-State Letters

Volumn 6, Issue 1, 2003, Pages

  Chen, S T ^a   Chen, G S ^a   Yang, T J ^a   Chang, T C ^b   Yang, W H ^c  

^a FENG CHIA UNIVERSITY   (Taiwan)

^b NATIONAL SUN YAT SEN UNIVERSITY   (Taiwan)

^c Honeywell Electron Mat Co Limited   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDROGEN; INTEGRATED CIRCUIT MANUFACTURE; MIXTURES; NITROGEN; PASSIVATION; PERMITTIVITY; PLASMA APPLICATIONS; PLASMA ETCHING; SILICONES; STRUCTURE (COMPOSITION);

HYBRID ORGANIC SILOXANE POLYMER; PLASMA DAMAGE; PLASMA PASSIVATION;

DIELECTRIC FILMS;

EID: 0037238631     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1525550     Document Type: Article

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