Physicochemical and structural properties of ultra thin films with embedded silicon particles

Surface and Coatings Technology

Volumn 201, Issue 22-23 SPEC. ISS., 2007, Pages 9179-9183

  Bedjaoui, M ^a   Despax, B ^a  

^a d'Hydraulique et des Telecommunications   (France)

Author keywords

81.07. b; 81.07.Wx; 81.15.Gh; 82.80.Gk; Pulsed PECVD; Silicon nanoparticles; SiOxNyHz films

Indexed keywords

AMORPHOUS SILICON; INFRARED SPECTROSCOPY; PHYSICAL CHEMISTRY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; STRUCTURAL PROPERTIES; ULTRATHIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

EMBEDDED SILICON PARTICLES; PLASMA PULSATION; SQUARE-WAVE MODULATED DISCHARGES;

NANOSTRUCTURED MATERIALS;

AMORPHOUS SILICON; INFRARED SPECTROSCOPY; NANOSTRUCTURED MATERIALS; PHYSICAL CHEMISTRY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; STRUCTURAL PROPERTIES; ULTRATHIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 34547669258     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2007.04.006     Document Type: Article

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