Formation and characteristics of silicon nanocrystals in plasma-enhanced chemical-vapor-deposited silicon-rich oxide

Journal of Applied Physics

Volumn 87, Issue 6, 2000, Pages 2808-2815

  Lin, Chi Fa ^a   Tseng, Wei Tsu ^b   Feng, Ming Shiann ^c  

^a WINBOND ELECTRONICS CORPORATION   (Taiwan)

^b NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

^c NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001496759     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.372260     Document Type: Article

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