RF discharge modelling in a N2O/SiH4 mixture for SiO2 deposition and comparison with experiment

Journal of Physics D: Applied Physics

Volumn 33, Issue 11, 2000, Pages 1332-1341

  Radouane, K ^a   Date, L ^a   Yousfi, M ^a   Despax, B ^a   Caquineau, H ^a  

^a CNRS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; DISSOCIATION; MASS TRANSFER; MATHEMATICAL MODELS; MIXTURES; NUMERICAL ANALYSIS; SILICA;

ELECTRICAL DISCHARGE MODEL; MASS TRANSFER MODELS; THIN FILM DEPOSITION;

ELECTRIC DISCHARGES;

EID: 0033686414     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/33/11/312     Document Type: Article

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