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Journal of Non-Crystalline Solids

Volumn 299-302, Issue , 2002, Pages 98-102

Fast deposition of microcrystalline silicon with an expanding thermal plasma

(5) Smit, C a,b Hamers, E A G a Korevaar, B A a,b Van de Sanden, M C M a Van Swaaij, R A C M M b

a EINDHOVEN UNIVERSITY OF TECHNOLOGY (Netherlands)

b DELFT UNIVERSITY OF TECHNOLOGY (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION; CRYSTAL GROWTH; DEPOSITION; MASS SPECTROMETRY; PHOTOCONDUCTIVITY; PLASMA APPLICATIONS; SCANNING ELECTRON MICROSCOPY; SOLAR CELLS;

THERMAL PLASMA;

SEMICONDUCTING SILICON;

EID: 0036538997 PISSN: 00223093 EISSN: None Source Type: Journal
DOI: 10.1016/S0022-3093(01)01184-X Document Type: Article

Times cited : (21)

References (10)

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2
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.