Deposition and growth kinetics studies of thin zirconium dioxide films by UVILS-CVD

Applied Surface Science

Volumn 253, Issue 19, 2007, Pages 7942-7946

  Chen, Mingliang ^a   Zhang, Xinyu ^a   Fang, Qi ^b   Zhang, Junying ^a   Lin, Zijing ^a   Boyd, Ian W ^b  

^a UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA   (China)

^b UNIVERSITY COLLEGE LONDON   (United Kingdom)

Author keywords

Metal oxide semiconductor field effect transistor; Microelectronic industry; UVILS CVD

Indexed keywords

CHEMICAL VAPOR DEPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MOSFET DEVICES; ULTRAVIOLET RADIATION; X RAY PHOTOELECTRON SPECTROSCOPY; ZIRCONIUM COMPOUNDS;

MICROELECTRONIC INDUSTRY; OXIDIZING AGENT; REACTION CHAMBERS; UVILS-CVD;

THIN FILMS;

EID: 34447331966     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2007.02.065     Document Type: Article

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