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Volumn 120-121, Issue , 1999, Pages 303-312

Properties of zirconium oxide thin films deposited by pulsed reactive magnetron sputtering

Author keywords

Hard coatings; Physical properties; Reactive sputtering; Zirconium oxide

Indexed keywords

COATING; DEPOSIT; FILM; PROPERTIES; SPUTTERING;

EID: 17344389234     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(99)00501-0     Document Type: Conference Paper
Times cited : (79)

References (28)
  • 2
    • 0003450568 scopus 로고
    • A.M. Alper. New York, USA: Academic Press
    • Garvie R.C. Alper A.M. High Temperature Oxides. 1970;118 Academic Press, New York, USA.
    • (1970) High Temperature Oxides , pp. 118
    • Garvie, R.C.1
  • 4
    • 0002097510 scopus 로고
    • Advances in Ceramics
    • A.H. Heuer, & L.W. Hobbs. Columbus, OH, USA: The American Ceramic Society
    • Subbarao E.C. Advances in Ceramics. Heuer A.H., Hobbs L.W. Science and Technology of Zirconia. 1981;1 The American Ceramic Society, Columbus, OH, USA.
    • (1981) Science and Technology of Zirconia , pp. 1
    • Subbarao, E.C.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.