Metalorganic precursor decomposition and oxidation mechanisms in plasma-enhanced ZrO 2 deposition

Journal of Applied Physics

Volumn 92, Issue 8, 2002, Pages 4238-4244

  Cho, Byeong Ok ^a   Wang, Jianjun ^a   Chang, Jane P ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHAMBER PRESSURE; CHEMICAL EFFECT; DISSOCIATION ENERGIES; FLOWRATE RATIO; GAS-PHASE REACTIONS; GRADUAL CHANGES; METAL ORGANIC PRECURSORS; MICROWAVE POWER; OXIDATION MECHANISMS; OXIDATION STATE; PHYSICAL EFFECTS; PLASMA ELECTRONS; PROCESS VARIABLES; QUADRUPOLE MASS SPECTROMETRY; REACTION PATHS; STEP CHANGES; TIME EVOLUTIONS; ZIRCONIUM OXIDATION;

ARGON; DISSOCIATION; MASS SPECTROMETRY; OXIDATION; PLASMA DEPOSITION; PLASMAS; VAPORS; ZIRCONIUM;

ZIRCONIUM ALLOYS;

EID: 18744386080     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1506421     Document Type: Article

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