-
1
-
-
0004245602
-
-
Semiconductor Industry Association
-
Semiconductor Industry Association, The International Technology Roadmap for Semiconductors (1999); 2000 Update (2000); 2004 Update (2004); 2005 Edition (2005). URL http://www.itrs.net
-
(1999)
The International Technology Roadmap for Semiconductors
-
-
-
2
-
-
33845944637
-
-
edited by S. P. Murarka, M. Eizenberg, and A. K. Sinha (Elsevier, Amsterdam
-
M. Eizenberg, in Interlayer Dielectrics for Semiconductor Technologies, edited by, S. P. Murarka,,, M. Eizenberg,, and, A. K. Sinha, (Elsevier, Amsterdam, 2003), p. 1.
-
(2003)
Interlayer Dielectrics for Semiconductor Technologies
, pp. 1
-
-
Eizenberg, M.1
-
3
-
-
32944459861
-
-
MTOUAN 1369-7021
-
B. D. Hatton, K. Landskron, W. J. Hunks, M. R. Bennett, D. Shukaris, D. D. Perovic, and G. A. Ozin, Mater. Today MTOUAN 1369-7021 9, 22 (2006).
-
(2006)
Mater. Today
, vol.9
, pp. 22
-
-
Hatton, B.D.1
Landskron, K.2
Hunks, W.J.3
Bennett, M.R.4
Shukaris, D.5
Perovic, D.D.6
Ozin, G.A.7
-
4
-
-
85047692605
-
-
MTOUAN 1369-7021 10.1016/S1369-7021(04)00287-1
-
D. Shamiryan, T. Abell, F. Iacopi, and K. Maex, Mater. Today MTOUAN 1369-7021 10.1016/S1369-7021(04)00287-1 7, 34 (2004).
-
(2004)
Mater. Today
, vol.7
, pp. 34
-
-
Shamiryan, D.1
Abell, T.2
Iacopi, F.3
Maex, K.4
-
5
-
-
84904028041
-
-
edited by S. P. Murarka, M. Eizenberg, and A. K. Sinha (Elsevier, Amsterdam
-
E. Ong and A. Sinha, in Interlayer Dielectrics for Semiconductor Technologies, edited by, S. P. Murarka,,, M. Eizenberg,, and, A. K. Sinha, (Elsevier, Amsterdam, 2003), p. 409.
-
(2003)
Interlayer Dielectrics for Semiconductor Technologies
, pp. 409
-
-
Ong, E.1
Sinha, A.2
-
8
-
-
0142057280
-
-
APPLAB 0003-6951 10.1063/1.1614438
-
S.-H. Rhee, M. D. Radwin, M. F. Ng, J. I. Martin, and D. Erb, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1614438 83, 2644 (2003).
-
(2003)
Appl. Phys. Lett.
, vol.83
, pp. 2644
-
-
Rhee, S.-H.1
Radwin, M.D.2
Ng, M.F.3
Martin, J.I.4
Erb, D.5
-
9
-
-
0028563606
-
-
edited by S. P. Murarka, A. Katz, K. N. Tu, and K. Maex, MRS Symp. Proc. No. Materials Research Society, Pittsburgh
-
S.-P. Jeng, R. H. Havemann, and M.-C. Chang, in Advanced Metallization for Devices and Circuits-Science Technology and Manufacturability, edited by, S. P. Murarka,,, A. Katz,,, K. N. Tu,, and, K. Maex,, MRS Symp. Proc. No. 337 (Materials Research Society, Pittsburgh, 1994), p. 25.
-
(1994)
Advanced Metallization for Devices and Circuits-Science Technology and Manufacturability
, vol.337
, pp. 25
-
-
Jeng, S.-P.1
Havemann, R.H.2
Chang, M.-C.3
-
10
-
-
34347401116
-
-
edited by S. P. Murarka, M. Einzenberg, and A. H. Sinha (Elsevier Academic Press, Amsterdam
-
M. Einzenberg, in Interlayer Dielectrics for Semiconductor Technologies, edited by, S. P. Murarka,,, M. Einzenberg,, and, A. H. Sinha, (Elsevier Academic Press, Amsterdam, 2003), p. 5.
-
(2003)
Interlayer Dielectrics for Semiconductor Technologies
, pp. 5
-
-
Einzenberg, M.1
-
11
-
-
34347403760
-
-
Proceedings of the International Interconnect Technology Conference-2001, San Francisco, 2001 (IEEE Press, Piscataway, NJ
-
S. Lin, C. Jin, M. Tsai, M. Daniels, A. Gonzalez, J. T. Wetzel, K. A. Monning, P. A. Winebager, S. Jang, D. Yu, and M. S. Liang, in Proceedings of the International Interconnect Technology Conference-2001, San Francisco, 2001 (IEEE Press, Piscataway, NJ, 2001) p. 146.
-
(2001)
, pp. 146
-
-
Lin, S.1
Jin, C.2
Tsai, M.3
Daniels, M.4
Gonzalez, A.5
Wetzel, J.T.6
Monning, K.A.7
Winebager, P.A.8
Jang, S.9
Yu, D.10
Liang, M.S.11
-
12
-
-
2142704413
-
-
JAPNDE 0021-4922
-
H. Miyoshi, H. Matsuo, Y. Oku, H. Tanaka, K. Yamada, N. Mikami, S. Takada, N. Hata, and T. Kikkawa, Jpn. J. Appl. Phys., Part 1 JAPNDE 0021-4922 43, 498 (2004).
-
(2004)
Jpn. J. Appl. Phys., Part 1
, vol.43
, pp. 498
-
-
Miyoshi, H.1
Matsuo, H.2
Oku, Y.3
Tanaka, H.4
Yamada, K.5
Mikami, N.6
Takada, S.7
Hata, N.8
Kikkawa, T.9
-
13
-
-
2142714581
-
-
JAPNDE 0021-4922
-
K. Uera, J. Kawahara, H. Miyoshi, N. Hata, and T. Kikkawa, Jpn. J. Appl. Phys., Part 1 JAPNDE 0021-4922 43, 504 (2004).
-
(2004)
Jpn. J. Appl. Phys., Part 1
, vol.43
, pp. 504
-
-
Uera, K.1
Kawahara, J.2
Miyoshi, H.3
Hata, N.4
Kikkawa, T.5
-
14
-
-
0031372934
-
-
edited by C. Case, P. Kohl, T. Kikkawa, and W. W. Lee, MRS Symp. Proc. No. Materials Research Society, Pittsburgh
-
P. H. Townsend, S. J. Martin, J. Godschalx, D. R. Romer, D. W. Smith, Jr., D. Castillo, R. DeVries, G. Buske, N. Rondan, S. Froelicher, J. Marshall, E. O. Shaffer, and H.-J. Im, in Low-Dielectric Constant Materials III, edited by, C. Case,,, P. Kohl,,, T. Kikkawa,, and, W. W. Lee,, MRS Symp. Proc. No. 476 (Materials Research Society, Pittsburgh, 1997), p. 9.
-
(1997)
Low-Dielectric Constant Materials III
, vol.476
, pp. 9
-
-
Townsend, P.H.1
Martin, S.J.2
Godschalx, J.3
Romer, D.R.4
Smith Jr., D.W.5
Castillo, D.6
Devries, R.7
Buske, G.8
Rondan, N.9
Froelicher, S.10
Marshall, J.11
Shaffer, E.O.12
Im, H.-J.13
-
15
-
-
84961742972
-
-
Proceedings of the IEEE International Interconnect Technology Conference-2002 (IEEE Press, Piscataway, NJ
-
S. Ogawa, T. Nasuno, M. Egami, and A. Nakashima, in Proceedings of the IEEE International Interconnect Technology Conference-2002 (IEEE Press, Piscataway, NJ, 2002) p. 220.
-
(2002)
, pp. 220
-
-
Ogawa, S.1
Nasuno, T.2
Egami, M.3
Nakashima, A.4
-
16
-
-
34347402142
-
-
Proceedings of IEEE International Interconnect Technology Conference-2001 (IEEE Press, Piscataway, NJ
-
Q. Han, W. Chen, C. Waldfried, O. Escorcia, N. M. Sbrockey, T. J. Bridgewater, E. S. Moyer, and I. Berry, in Proceedings of IEEE International Interconnect Technology Conference-2001 (IEEE Press, Piscataway, NJ, 2001) p. 171.
-
(2001)
, pp. 171
-
-
Han, Q.1
Chen, W.2
Waldfried, C.3
Escorcia, O.4
Sbrockey, N.M.5
Bridgewater, T.J.6
Moyer, E.S.7
Berry, I.8
-
17
-
-
0033569683
-
-
SCIEAS 0036-8075 10.1126/science.286.5439.421
-
R. D. Miller, Science SCIEAS 0036-8075 10.1126/science.286.5439.421 286, 421 (1999).
-
(1999)
Science
, vol.286
, pp. 421
-
-
Miller, R.D.1
-
19
-
-
0037666297
-
-
JAPIAU 0021-8979 10.1063/1.1567460
-
K. Maex, M. R. Baklanov, D. Shamiryan, F. Iacopi, S. H. Brongersma, and Z. S. Yanovitskaya, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.1567460 93, 8793 (2003).
-
(2003)
J. Appl. Phys.
, vol.93
, pp. 8793
-
-
Maex, K.1
Baklanov, M.R.2
Shamiryan, D.3
Iacopi, F.4
Brongersma, S.H.5
Yanovitskaya, Z.S.6
-
21
-
-
0032162553
-
-
MIGIEA 0927-796X 10.1016/S0927-796X(98)00012-6
-
T. Homma, Mater. Sci. Eng., R. MIGIEA 0927-796X 10.1016/S0927-796X(98) 00012-6 23, 243 (1998).
-
(1998)
Mater. Sci. Eng., R.
, vol.23
, pp. 243
-
-
Homma, T.1
-
22
-
-
23444445736
-
-
MIENEF 0167-9317
-
H. Hermann, A. Elsner, M. Hecker, and D. Stoyan, Microelectron. Eng. MIENEF 0167-9317 81, 535 (2005).
-
(2005)
Microelectron. Eng.
, vol.81
, pp. 535
-
-
Hermann, H.1
Elsner, A.2
Hecker, M.3
Stoyan, D.4
-
23
-
-
0035576128
-
-
JAPIAU 0021-8979 10.1063/1.1412266
-
A. Jain, S. Rogojevic, W. N. Gill, J. L. Plawsky, I. Matthew, M. Tomozawa, and E. Simonyi, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.1412266 90, 5832 (2001).
-
(2001)
J. Appl. Phys.
, vol.90
, pp. 5832
-
-
Jain, A.1
Rogojevic, S.2
Gill, W.N.3
Plawsky, J.L.4
Matthew, I.5
Tomozawa, M.6
Simonyi, E.7
-
24
-
-
79956054897
-
-
APPLAB 0003-6951 10.1063/1.1478775
-
C. M. Flannery, T. Wittkowski, K. Jung, B. Hillebrands, and M. R. Baklanov, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1478775 80, 4594 (2002).
-
(2002)
Appl. Phys. Lett.
, vol.80
, pp. 4594
-
-
Flannery, C.M.1
Wittkowski, T.2
Jung, K.3
Hillebrands, B.4
Baklanov, M.R.5
-
25
-
-
28044472490
-
-
MIENEF 0167-9317 10.1016/j.mee.2005.07.021
-
H. Hermann, K. Zagorodniy, A. Touzik, M. Taut, and G. Seifert, Microelectron. Eng. MIENEF 0167-9317 10.1016/j.mee.2005.07.021 82, 387 (2005).
-
(2005)
Microelectron. Eng.
, vol.82
, pp. 387
-
-
Hermann, H.1
Zagorodniy, K.2
Touzik, A.3
Taut, M.4
Seifert, G.5
-
26
-
-
34347393799
-
-
HYPERCHEM 7.52
-
HYPERCHEM 7.52, http://www.hyper.com/products/Professional/index.htm
-
-
-
-
27
-
-
0001257583
-
-
PRBMDO 0163-1829 10.1103/PhysRevB.52.12
-
D. Porezag, Th. Frauenheim, Th. Köhler, G. Seifert, and R. Kaschner, Phys. Rev. B PRBMDO 0163-1829 10.1103/PhysRevB.52.12 51, 12 947 (1995).
-
(1995)
Phys. Rev. B
, vol.51
, pp. 12947
-
-
Porezag, D.1
Frauenheim, Th.2
Köhler, Th.3
Seifert, G.4
Kaschner, R.5
-
28
-
-
0007638285
-
-
IJQCB2 0020-7608 10.1002/(SICI)1097-461X(1996)58:2<185::AID-QUA7>3. 0.CO;2-U
-
G. Seifert, D. Porezag, and T. Frauenheim, Int. J. Quantum Chem. IJQCB2 0020-7608 10.1002/(SICI)1097-461X(1996)58:2<185::AID-QUA7>3.0.CO;2-U 58, 185 (1996).
-
(1996)
Int. J. Quantum Chem.
, vol.58
, pp. 185
-
-
Seifert, G.1
Porezag, D.2
Frauenheim, T.3
-
29
-
-
0001170752
-
-
PRBMDO 0163-1829 10.1103/PhysRevB.48.2748
-
F. Leclercq, P. Damay, M. Foukani, P. Chieux, M. C. Bellissent-Funel, A. Rassat, and C. Fabre, Phys. Rev. B PRBMDO 0163-1829 10.1103/PhysRevB.48.2748 48, 2748 (1993).
-
(1993)
Phys. Rev. B
, vol.48
, pp. 2748
-
-
Leclercq, F.1
Damay, P.2
Foukani, M.3
Chieux, P.4
Bellissent-Funel, M.C.5
Rassat, A.6
Fabre, C.7
-
33
-
-
84986483831
-
-
JCCHDD 0192-8651 10.1002/jcc.540160105
-
A. H. de Vries, P. T. van Duijnen, A. H. Juffer, J. A. C. Rullmann, J. P. Dijkman, H. Merenga, and B. T. Thole, J. Comput. Chem. JCCHDD 0192-8651 10.1002/jcc.540160105 16, 37 (1995).
-
(1995)
J. Comput. Chem.
, vol.16
, pp. 37
-
-
De Vries, A.H.1
Van Duijnen, P.T.2
Juffer, A.H.3
Rullmann, J.A.C.4
Dijkman, J.P.5
Merenga, H.6
Thole, B.T.7
-
34
-
-
0001303934
-
-
CMPHC2 0301-0104 10.1016/0301-0104(82)87020-1
-
B. T. Thole and P. T. van Duijnen, Chem. Phys. CMPHC2 0301-0104 10.1016/0301-0104(82)87020-1 71, 211 (1982).
-
(1982)
Chem. Phys.
, vol.71
, pp. 211
-
-
Thole, B.T.1
Van Duijnen, P.T.2
-
36
-
-
84963975379
-
-
JCPSA6 0021-9606 10.1063/1.1512278
-
P. T. van Duijnen, A. H. de Vries, M. Swart, and F. Grozema, J. Chem. Phys. JCPSA6 0021-9606 10.1063/1.1512278 117, 8442 (2002).
-
(2002)
J. Chem. Phys.
, vol.117
, pp. 8442
-
-
Van Duijnen, P.T.1
De Vries, A.H.2
Swart, M.3
Grozema, F.4
-
37
-
-
84961974339
-
-
JCPSA6 0021-9606 10.1063/1.478729
-
D. M. Chipman, J. Chem. Phys. JCPSA6 0021-9606 10.1063/1.478729 110, 8012 (1999).
-
(1999)
J. Chem. Phys.
, vol.110
, pp. 8012
-
-
Chipman, D.M.1
-
38
-
-
33646423267
-
-
PLRAAN 1050-2947 10.1103/PhysRevA.73.054501
-
K. Zagorodniy, M. Taut, and H. Hermann, Phys. Rev. A PLRAAN 1050-2947 10.1103/PhysRevA.73.054501 73, 054501 (2006).
-
(2006)
Phys. Rev. a
, vol.73
, pp. 054501
-
-
Zagorodniy, K.1
Taut, M.2
Hermann, H.3
-
39
-
-
0000572926
-
-
ADVMEW 0935-9648 10.1002/adma.19930051116
-
A. Hirsch, Adv. Mater. (Weinheim, Ger.) ADVMEW 0935-9648 10.1002/adma.19930051116 5, 859 (1993).
-
(1993)
Adv. Mater. (Weinheim, Ger.)
, vol.5
, pp. 859
-
-
Hirsch, A.1
-
40
-
-
9344227930
-
-
PRPSB8 0079-6700 10.1016/j.progpolymsci.2004.08.001
-
C. Wang, Z.-X. Guo, S. Fu, W. Wu, and D. Zhu, Prog. Polym. Sci. PRPSB8 0079-6700 10.1016/j.progpolymsci.2004.08.001 29, 1079 (2004).
-
(2004)
Prog. Polym. Sci.
, vol.29
, pp. 1079
-
-
Wang, C.1
Guo, Z.-X.2
Fu, S.3
Wu, W.4
Zhu, D.5
-
41
-
-
34347394232
-
-
edited by P. C. Eklund and A. M. Rao (Springer, Berlin
-
M. S. Meier, in Fullerene Polymers and Fullerene Polymer Composites, edited by, P. C. Eklund, and, A. M. Rao, (Springer, Berlin, 2000), p. 369.
-
(2000)
Fullerene Polymers and Fullerene Polymer Composites
, pp. 369
-
-
Meier, M.S.1
-
42
-
-
0035504898
-
-
JSGTEC 0928-0707
-
H. Peng, J. W. Y. Lam, F. S. M. Leung, T. W. H. Poon, A. X. Wu, N.-T. Yu, and B. Z. Tang, J. Sol-Gel Sci. Technol. JSGTEC 0928-0707 22, 205 (2001).
-
(2001)
J. Sol-Gel Sci. Technol.
, vol.22
, pp. 205
-
-
Peng, H.1
Lam, J.W.Y.2
Leung, F.S.M.3
Poon, T.W.H.4
Wu, A.X.5
Yu, N.-T.6
Tang, B.Z.7
-
43
-
-
0032654387
-
-
MCRLAS 0026-2714 10.1016/S0026-2714(98)00237-6
-
A. Courtot-Descharles, F. Pires, P. Paillet, and J. L. Leay, Microelectron. Reliab. MCRLAS 0026-2714 10.1016/S0026-2714(98)00237-6 39, 279 (1999).
-
(1999)
Microelectron. Reliab.
, vol.39
, pp. 279
-
-
Courtot-Descharles, A.1
Pires, F.2
Paillet, P.3
Leay, J.L.4
-
44
-
-
33749159152
-
-
PRBMDO 0163-1829 10.1103/PhysRevB.72.012102
-
G. Seifert, A. N. Enyashin, and T. Heine, Phys. Rev. B PRBMDO 0163-1829 10.1103/PhysRevB.72.012102 72, 012102 (2005).
-
(2005)
Phys. Rev. B
, vol.72
, pp. 012102
-
-
Seifert, G.1
Enyashin, A.N.2
Heine, T.3
-
45
-
-
33745891220
-
-
PPCPFQ 1463-9076 10.1039/b604737h
-
A. Enyashin, S. Gemming, T. Heine, G. Seifert, and L. Zhechov, Phys. Chem. Chem. Phys. PPCPFQ 1463-9076 10.1039/b604737h 8, 3320 (2006).
-
(2006)
Phys. Chem. Chem. Phys.
, vol.8
, pp. 3320
-
-
Enyashin, A.1
Gemming, S.2
Heine, T.3
Seifert, G.4
Zhechov, L.5
-
46
-
-
33751239761
-
-
PSSBBD 0370-1972 10.1002/pssb.200669165
-
G. Bortel, G. Faigel, I. Kováts, G. Oszlányi, and S. Pekker, Phys. Status Solidi B PSSBBD 0370-1972 10.1002/pssb.200669165 243, 2999 (2006).
-
(2006)
Phys. Status Solidi B
, vol.243
, pp. 2999
-
-
Bortel, G.1
Faigel, G.2
Kováts, I.3
Oszlányi, G.4
Pekker, S.5
-
47
-
-
0032475699
-
-
JNCSBJ 0022-3093 10.1016/S0022-3093(98)00712-1
-
S. Hasegawa, T. Tsukaoka, T. Inokuma, and Y. Kurata, J. Non-Cryst. Solids JNCSBJ 0022-3093 10.1016/S0022-3093(98)00712-1 240, 154 (1998).
-
(1998)
J. Non-Cryst. Solids
, vol.240
, pp. 154
-
-
Hasegawa, S.1
Tsukaoka, T.2
Inokuma, T.3
Kurata, Y.4
-
49
-
-
34347397686
-
-
edited by S. P. Murarka, M. Einzenberg, and A. H. Sinha (Elsevier Academic Press, Amsterdam
-
S. P. Murarka, in Interlayer Dielectrics for Semiconductor Technologies, edited by, S. P. Murarka,,, M. Einzenberg,, and, A. H. Sinha, (Elsevier Academic Press, Amsterdam, 2003), p. 168.
-
(2003)
Interlayer Dielectrics for Semiconductor Technologies
, pp. 168
-
-
Murarka, S.P.1
-
50
-
-
0345720252
-
-
JACSAT 0002-7863 10.1021/ja00179a044
-
K. Miller, J. Am. Chem. Soc. JACSAT 0002-7863 10.1021/ja00179a044 112, 8533 (1990).
-
(1990)
J. Am. Chem. Soc.
, vol.112
, pp. 8533
-
-
Miller, K.1
-
51
-
-
33646371255
-
-
PRLTAO 0031-9007 10.1103/PhysRevLett.96.166801
-
B. Kozinsky and N. Marzari, Phys. Rev. Lett. PRLTAO 0031-9007 10.1103/PhysRevLett.96.166801 96, 166801 (2006).
-
(2006)
Phys. Rev. Lett.
, vol.96
, pp. 166801
-
-
Kozinsky, B.1
Marzari, N.2
-
53
-
-
0035886495
-
-
PRBMDO 0163-1829 10.1103/PhysRevB.64.165408
-
J. M. Cabrera-Trujillo and J. Robles, Phys. Rev. B PRBMDO 0163-1829 10.1103/PhysRevB.64.165408 64, 165408 (2001).
-
(2001)
Phys. Rev. B
, vol.64
, pp. 165408
-
-
Cabrera-Trujillo, J.M.1
Robles, J.2
-
56
-
-
14544292987
-
-
FEROA8 0015-0193
-
D. Vanderbilt, Ferroelectrics FEROA8 0015-0193 301, 9 (2004).
-
(2004)
Ferroelectrics
, vol.301
, pp. 9
-
-
Vanderbilt, D.1
-
57
-
-
1842531937
-
-
PRBMDO 0163-1829 10.1103/PhysRevB.69.085106
-
I. Souza, J. Iniguez, and D. Vanderbilt, Phys. Rev. B PRBMDO 0163-1829 10.1103/PhysRevB.69.085106 69, 085106 (2004).
-
(2004)
Phys. Rev. B
, vol.69
, pp. 085106
-
-
Souza, I.1
Iniguez, J.2
Vanderbilt, D.3
-
58
-
-
0037048416
-
-
PRLTAO 0031-9007 10.1103/PhysRevLett.89.117602
-
I. Souza, J. Iniguez, and D. Vanderbilt, Phys. Rev. Lett. PRLTAO 0031-9007 10.1103/PhysRevLett.89.117602 89, 117602 (2002).
-
(2002)
Phys. Rev. Lett.
, vol.89
, pp. 117602
-
-
Souza, I.1
Iniguez, J.2
Vanderbilt, D.3
-
59
-
-
0037037908
-
-
PRLTAO 0031-9007 10.1103/PhysRevLett.89.157602
-
P. Umari and A. Pasquarello, Phys. Rev. Lett. PRLTAO 0031-9007 10.1103/PhysRevLett.89.157602 89, 157602 (2002).
-
(2002)
Phys. Rev. Lett.
, vol.89
, pp. 157602
-
-
Umari, P.1
Pasquarello, A.2
|