Molecular Orbital Calculation of the Elastic Modulus and the Dielectric Constant for Ultra Low-k Organic Polymers

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 43, Issue 2, 2004, Pages 504-507

  Uera, Kazuyoshi ^a   Kawahara, Jun ^b   Miyoshi, Hidenori ^b   Hata, Nobuhiro ^a   Kikkawa, Takamaro ^a,c  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

^c HIROSHIMA UNIVERSITY   (Japan)

Author keywords

Copolymer; Dielectric constant; Diels Alder; Elastic modulus; Low k; Mechanical property; Molecular orbital; Organic

Indexed keywords

CHEMICAL MECHANICAL POLISHING; COPOLYMERIZATION; DIELECTRIC FILMS; ELASTIC MODULI; MOLECULAR DYNAMICS; MOLECULAR STRUCTURE; PERMITTIVITY; POLYNOMIALS; SYNTHESIS (CHEMICAL); ULSI CIRCUITS;

DIELS-ALDER REACTION; LOW-K MATERIALS; MOLECULAR ORBITAL METHOD;

OLIGOMERS;

EID: 2142714581     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.43.504     Document Type: Article

References (16)

1. The International Technology Roadmap for Semiconductors, 2001 Edition (Semiconductor Industry Association, 2001).
2. S. Lin, C. Jin, L. Lui, M. Tsai, M. Daniels, A. Gonzalez, J. T. Wetzel, K. A. Monnig, P. A. Winebarger, S. Jang, D. Yu and M. S. Liang: Proc. of the 2001 Int. Interconnect Technology Conf., San Francisco, 2001 (IEEE Press, New Jersey, 2001) p. 146.
3. K. Yamada, A. Saiki, H. Sakaue, S. Shingubara and T. Takahagi: Jpn. J. Appl. Phys. 40 (2001) 4829.
4. T. Ikegami and K. Yamashita: Ext. Abst. ADMETA 2001: Advanced Metallization Conf. 2001: Asian Session, Tokyo, 2001, p. 40.
5. T. Takahagi, A. Saiki, H. Sakaue and S. Shingubara: Jpn. J. Appl. Phys. 42 (2003) 157.
6. T. Fukuda, H. Nishino, A. Matsuura, H. Matsunaga and H. Itoh: Proc. Advanced Metallization Conf. 2001 (AMC2001), Montreal and Tokyo, 2001 (Materials Research Society, Pennsylvania, 2002) p. 493.
7. J. Wang, F. G. Shi, T. G. Nieh, B. Zhao, M. R. Brongo, S. Qu and T. Rosenmayer: Scripta mater. 42 (2000) 687.
8. R. T. Morrison and R. N. Boyd: Organic Chemistry (Prentice-Hall International, New Jersey, 1992) pp. 1005, 1013.
9. J. Martin, J. P. Godschalx, M. E. Mills, E. O. Shaffer, H and P. H. Townsend: Adv. Mater. 12 (2000) 1769.
10. T. M. Stokich, Jr., W. M. Lee and R. A. Peters; Mat. Res. Soc. Symp. Proc. 227 (1991) 103.
11. Gaussian 98, Revision A.9, Gaussian, Inc., Pittsburgh PA, 1998.
12. M. J. S. Dewar, E. G. Zoebisch and E. F. Healy: J. Am. Chem. Soc. 107 (1985) 3902.
13. A. Courtot-Descharles, F. Pires, P. Paillet and J. L. Leray: Microelectron. Reliab. 39 (1999) 279.
14. R. F. W. Bader, M. T. Carroll, J. R. Cheeseman and C. Chang: J. Am. Chem. Soc. 109 (1987) 7968.
15. J. R. Shoemaker, T. Horn, P. D. Haaland, R. Pachter and W. W. Adams: Polymer 33 (1992) 3351.
16. B. Crist and P. G. Herena: J. Polym. Sci. B 34 (1996) 449.