Calculation of effective dielectric constants for advanced interconnect structures with low-k dielectrics

Applied Physics Letters

Volumn 83, Issue 13, 2003, Pages 2644-2646

  Rhee, Seung Hyun ^a   Radwin, Martin D ^b   Ng, Man Fai ^a   Martin, Jeremy I ^a   Erb, Darrell ^b  

^a IBM   (United States)

^b ADVANCED MICRO DEVICES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITANCE; CHEMICAL MECHANICAL POLISHING; DIELECTRIC MATERIALS;

INTERCONNECT STRUCTURES;

PERMITTIVITY;

EID: 0142057280     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1614438     Document Type: Article

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