Polycrystalline silicon thin films prepared by plasma enhanced chemical vapour deposition at 200°C using fluorinated source gas

Journal of Physics D: Applied Physics

Volumn 32, Issue 3, 1999, Pages 208-212

  Hazra, Sukti ^a   Saha, S C ^a   Ray, Swati ^a  

^a DEPARTMENT OF MATERIALS SCIENCE   (India)

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER MOBILITY; GRAIN SIZE AND SHAPE; PHOTOCONDUCTIVITY; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; SURFACES; THIN FILMS; X RAY DIFFRACTION; ENERGY TRANSFER; PLASMA APPLICATIONS; POLYCRYSTALLINE MATERIALS; SEMICONDUCTING SILICON;

FLUORINATED SOURCE GAS; POLYCRYSTALLINE SILICON THIN FILMS;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; CHEMICAL VAPOR DEPOSITION;

EID: 0033531275     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/32/3/005     Document Type: Article

References (20)

1. LeComber P G 1989 J. Non-Cryst. Solids 115 1
2. Matsuyama T, Tanaka M, Tsuda S, Nakano S and Kuwano Y 1993 Japan. J. Appl. Phys. 32 3720
3. Matsumura H 1984 J. Appl. Phys. 65 4396
4. Matsuo N, Sugiyama T and Miyoshi T 1996 Japan. J. Appl. Phys. 35 L1215
5. Nakata M, Sakai A, Uematsu T, Namikawa T, Shirai H, Hanna J and Shimizu I 1991 Phil. Mag. B 63 87
6. Donahue T J and Reif R 1985 J. Appl. Phys. 57 2757
7. Cuniot M, Dixmier J, Elkuim P, Bardel E and Bourée J E 1994 12th European Photovoltaic Solar Energy Conf. (Amsterdam) p 1819
8. Tanabe H, Azuma M, Uematsu T, Shirai H and Shimizu I 1989 Mater. Res. Soc. Symp. Proc. 149 17
9. Shibata N, Fukuda K, Ohtoshi H, Hanna J, Oda S and Shimizu I 1987 Japan. J. Appl. Phys. 26 L10
10. Woo J I, Lim H J and Jang J 1994 Appl. Phys. Lett. 65 1644
11. Lim H J, Ryu B Y, Reu J I and Jang J 1996 Thin Solid Films 289 227
12. Wang K C, Cheng K L, Jiang Y L, Yaw T R and Hwang H L 1995 Japan. J. Appl. Phys. 34 927
13. Nakata N, Sakai A, Uematsu T, Namikawa T, Shirai H, Hanna J and Shimizu I 1991 Phil. Mag. B 63 87
14. Ishihara S, He D, Nakata M and Shimizu I 1993 Japan. J. Appl. Phys. 32 264
15. Ishihara S, He D, Akasaka T, Araki Y and Shimizu I 1993 Mater. Res. Soc. Symp. Proc. 297 79
16. Kakinuma H, Mohri M and Tsuruoka T 1995 J. Appl. Phys. 77 646
17. Shanks H, Fang C J, Ley L, Cardona M, Demond F J and Kalbitzer 1980 Phys. Status Solidi b 100 43
18. Madan A and Ovshinsky S R 1980 J. Non-Cryst. Solids 35& 36 171
19. Madan A, Ovshinsky S R and Benn E 1979 Phil. Mag. B 40 259
20. Lucovsky G 1979 Solid State Commun. 29 571