Microcrystalline silicon films deposited by hot-wire CVD for solar cells on low-temperature substrate

Solar Energy Materials and Solar Cells

Volumn 66, Issue 1-4, 2001, Pages 421-429

  Niikura, C ^a   Brenot, R ^a   Guillet, J ^a   Bouree J E ^a   Kleider, J P ^b   Bruggemann R ^b   Longeaud, C ^b  

^a LABORATOIRE DE PHYSIQUE DES INTERFACES ET DES COUCHES MINCES   (France)

^b UNIV PARIS SUD   (France)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; CHEMICAL VAPOR DEPOSITION; CRYSTALLINE MATERIALS; ELLIPSOMETRY; FILM PREPARATION; HYDROGEN; LOW TEMPERATURE EFFECTS; THIN FILMS;

CATALYTIC CHEMICAL VAPOR DEPOSITION; HOT WIRE CHEMICAL VAPOR DEPOSITION; MICROCRYSTALLINE SILICON;

SILICON SOLAR CELLS;

EID: 0035253958     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0927-0248(00)00203-8     Document Type: Article

References (11)

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