Evaluation of resolution and LER in the resist patterns replicated by EUV micro-exposure tools

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6151 I, Issue , 2006, Pages

  Kikuchi, Yukiko ^a   Tanaka, Yuusuke ^a   Oizumi, Hiroaki ^a   Kumasaka, Fumiaki ^a   Goo, DooHoon ^a   Nishiyama, Iwao ^a  

^a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

Author keywords

Chemically amplified resist; EUV; HiNA; LER; MET; Resolution; Sensitivity

Indexed keywords

CHEMICALLY AMPLIFIED RESIST; EUV; HINA; LER; MET; NUMERICAL APERTURE (NA);

INTEGRATED CIRCUIT MANUFACTURE; OPTICAL RESOLVING POWER; ULTRAVIOLET DEVICES;

LITHOGRAPHY;

EID: 33745599580     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.655106     Document Type: Conference Paper

References (13)

1. E.M.Gullikson, "Scattering from normal incidence EUV optics," Proc., SPIE Vol.3331 (1998) pp. 72-80
2. The International Roadmap for Semiconductors 2005 Edition, http://www.itrs.net/Commom/2005ITRS/Home2005.htm
3. Edward W. Scheckler, Shoji Shukuri and Eiji Takeda, "Molecular scalr E-Beam Resist Development Simulation for Pattern Fluctuation Analysis," Jpn. J. Appl. Phys. Vol.32 (1993) pp. 327-333
4. A.M. Goethals, R. Gronheid, L.H.A. Leunissen, F. Van Roey and H.H. Solak, "EUV Resist Screening: Current Performance and Issues," J. Photopolym. Sci. Technol., Vol.18, No. 5 (2005) pp. 647-654
5. H.B. Cao, W. Yueh, J. Roberts, B. Rice, R. Bristol, M. Chandhok, "EUV Resist Patterning Performance from the Intel Microexposure Tool (MET)," Proc., SPIE Vol. 5753 (2005) pp.459-466
6. th International Symposium for EUV lithography (2005)
7. T. Oshino, et al., "Development of projection optics set-3 for high-numerical-aperture extreme ultraviolet exposure tool (HiNA)," J. Vac. Sci. Technol. B 22(6) (2004) pp.2975-2979
8. P.P. Naulleau, K.A. Goldberg, E. Anderson, J.P. Cain, P. Denham, K. Jacson, A.s. Morlens, S. Rekawa and F. Salmassi, "Extreme ultraviolet microexposure at the Advance Light Source using the 0.3 numerical aperture micro-exposure tool optic," J. Vac. Sci. Technol. B 22(6) (2004) pp. 2962-2965
9. K. Yamada and T. Hosokawa, "Superconductiong Electron Storage Ring: Super ALIS," Review, Vol.10, No.6 Nov. (1998) pp.47-54
10. H. Oizumi, et al., Y. Tanaka, F. Kumasaka, I. Nishiyama, H. Kondo, M. Shiraishi, T. Oshino, K. Sugisaki, M. Murakami, "Lithographic Performance of High-Numerical-Aperture (NA=0.3) EUV Small-Field Exposure Tool (HINA)," Proc., SPIE, Vol. 5751 (2005) pp.102-109
11. P.P. Naulleau, K.A. Goldberg, P. Batson, J. Bokor, P. Denham and S. Rekawa, "Fourier-synthesis custom-coherence illuminator for extreme ultraviolet microfield lithography," Applied Optics, Vol. 42, No.5 (2003) pp.820-826
12. Y. Tanaka, H. Oizumi, T. Hashimoto, F. Kumasaka, I. Nishiyama, T. Abe, H. Mohri, Hayashi, "Evaluation of pattern fidelity in EUVL using a high-numerical-aperture small-field EUV exposure tool (HiNA)," Proc., SPIE, Vol. 5751 (2005) pp.733-740
13. H. Oizumi, Y. Tanaka, F. Kumasaka and I. Nishiyama, "Ultimate fine-pitch resist patterning using the ASET-HINA," Presented and submitted at Microlithography 2006, Paper number 6151-95