Sheath thickness evaluation for collisionless or weakly collisional bounded plasmas

IEEE Transactions on Plasma Science

Volumn 27, Issue 5, 1999, Pages 1358-1365

  Wang, Shiang Bau ^a   Wendt, Amy E ^a  

^a University of Wisconsin Madison   (United States)

Author keywords

Modeling; Plasma measurements; Plasma sheaths; Plasmas; Space charge

Indexed keywords

ELECTRIC FIELD EFFECTS; ELECTRIC POTENTIAL; ELECTRIC SPACE CHARGE; IONS; MATHEMATICAL MODELS; PLASMA COLLISION PROCESSES;

CHILD-LANGMUIR LAW; POISSON'S EQUATION;

PLASMA SHEATHS;

EID: 0033204390     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/27.799813     Document Type: Article

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