104 nm period grating fabrication in fused silica by immersion two-beam interferometric laser induced backside wet etching technique

Applied Physics A: Materials Science and Processing

Volumn 87, Issue 4, 2007, Pages 611-613

  Vass, C ^a   Osvay, K ^a   Hopp, B ^b   Bor, Z ^a  

^a UNIVERSITY OF SZEGED   (Hungary)

^b RESEARCH GROUP ON LASER PHYSICS   (Hungary)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORBENTS; FUSED SILICA; INTERFEROMETRY; LASER BEAM EFFECTS; NEODYMIUM LASERS; WET ETCHING;

FUSED SILICA GRATINGS; GRATING CONSTANT; INTERFEROMETRIC LASERS; METHYL METHACRYLATE;

DIFFRACTION GRATINGS;

EID: 34247376821     PISSN: 09478396     EISSN: 14320630     Source Type: Journal    
DOI: 10.1007/s00339-007-3891-2     Document Type: Article

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