Fabrication of 150 nm period grating in fused silica by two-beam interferometric laser induced backside wet etching method

Optics Express

Volumn 14, Issue 18, 2006, Pages 8354-8359

  Vass, Csaba ^a   Osvay, Károly ^a   Hopp, Béla ^b  

^a UNIVERSITY OF SZEGED   (Hungary)

^b RESEARCH GROUP ON LASER PHYSICS   (Hungary)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; DIFFRACTION GRATINGS; ETCHING; INTERFEROMETRY; LASER BEAM EFFECTS;

TWO-BEAM INTERFEROMETRIC LASER; TWO-BEAM INTERFEROMETRIC LASER INDUCED BACKSIDE WET ETCHING (TWIN-LIBWE); WET ETCHING METHOD;

FUSED SILICA;

EID: 33748335387     PISSN: 10944087     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.14.008354     Document Type: Article

References (15)

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