메뉴 건너뛰기




Volumn 54, Issue 4, 2007, Pages 869-874

An effective channel mobility-based analytical on-current model for polycrystalline silicon thin-film transistors

Author keywords

Barrier controlled conduction; Drain current modeling; Effective channel mobility; Mobility degradation; Polycrystalline silicon (poly Si); Thin film transistors (TFTs)

Indexed keywords

CARRIER MOBILITY; DRAIN CURRENT; MATHEMATICAL MODELS; POLYSILICON;

EID: 34147180394     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/TED.2007.891248     Document Type: Article
Times cited : (42)

References (23)
  • 3
    • 0042164526 scopus 로고    scopus 로고
    • Assessment of the performance of laser-based lateral-crystallization technology via analysis and modeling of polysilicon thin-film-transistor mobility
    • Jun
    • A. T. Voutsas, "Assessment of the performance of laser-based lateral-crystallization technology via analysis and modeling of polysilicon thin-film-transistor mobility," IEEE Trans. Electron Devices, vol. 50, no. 6, pp. 1494-1500, Jun. 2003.
    • (2003) IEEE Trans. Electron Devices , vol.50 , Issue.6 , pp. 1494-1500
    • Voutsas, A.T.1
  • 5
    • 23344433693 scopus 로고    scopus 로고
    • ON-state drain-current modeling of large-grain poly-Si TFTs based on carrier transport through latitudinal and longitudinal grain boundaries
    • Aug
    • A. T. Hatzopoulos, D. H. Tassis, N. A. Hastas, C. A. Dimitriadis, and G. Kamarinos, "ON-state drain-current modeling of large-grain poly-Si TFTs based on carrier transport through latitudinal and longitudinal grain boundaries," IEEE Trans. Electron Devices, vol. 52, no. 8, pp. 1727-1733, Aug. 2005.
    • (2005) IEEE Trans. Electron Devices , vol.52 , Issue.8 , pp. 1727-1733
    • Hatzopoulos, A.T.1    Tassis, D.H.2    Hastas, N.A.3    Dimitriadis, C.A.4    Kamarinos, G.5
  • 6
    • 27644491502 scopus 로고    scopus 로고
    • On-current modeling of polycrystalline silicon thin-film transistors
    • N. Gupta and B. P. Tyagi, "On-current modeling of polycrystalline silicon thin-film transistors," Phys. Scr., vol. 72, no. 4, pp. 339-342, 2005.
    • (2005) Phys. Scr , vol.72 , Issue.4 , pp. 339-342
    • Gupta, N.1    Tyagi, B.P.2
  • 7
    • 0030241288 scopus 로고    scopus 로고
    • Threshold voltage, field effect mobility, and gate-to-channel capacitance in polysilicon TFT's
    • Sep
    • M. D. Jacunski, M. S. Shur, and M. Hack, "Threshold voltage, field effect mobility, and gate-to-channel capacitance in polysilicon TFT's," IEEE Trans. Electron Devices, vol. 43, no. 9, pp. 1433-1440, Sep. 1996.
    • (1996) IEEE Trans. Electron Devices , vol.43 , Issue.9 , pp. 1433-1440
    • Jacunski, M.D.1    Shur, M.S.2    Hack, M.3
  • 8
    • 0032740570 scopus 로고    scopus 로고
    • A physical-based analytical turn-on model of polysilicon thin-film transistors for circuit simulation
    • Jan
    • G.-Y. Yang, S.-H. Hur, and C.-H. Han, "A physical-based analytical turn-on model of polysilicon thin-film transistors for circuit simulation," IEEE Trans. Electron Devices, vol. 46, no. 1, pp. 165-172, Jan. 1999.
    • (1999) IEEE Trans. Electron Devices , vol.46 , Issue.1 , pp. 165-172
    • Yang, G.-Y.1    Hur, S.-H.2    Han, C.-H.3
  • 9
    • 0000854914 scopus 로고    scopus 로고
    • On the threshold voltage and channel conductance of polycrystalline silicon thin-film transistors
    • Apr
    • C. A. Dimitriadis and D. H. Tassis, "On the threshold voltage and channel conductance of polycrystalline silicon thin-film transistors," J. Appl. Phys., vol. 79, no. 8, pp. 4431-4437, Apr. 1996.
    • (1996) J. Appl. Phys , vol.79 , Issue.8 , pp. 4431-4437
    • Dimitriadis, C.A.1    Tassis, D.H.2
  • 10
    • 0001176476 scopus 로고    scopus 로고
    • Quasidrift limited field-effect current in polycrystalline silicon: Wide grain boundary approximation
    • Aug
    • W. Eccleston, "Quasidrift limited field-effect current in polycrystalline silicon: Wide grain boundary approximation," J. Appl. Phys., vol. 84, no. 3, pp. 1697-1702, Aug. 1998.
    • (1998) J. Appl. Phys , vol.84 , Issue.3 , pp. 1697-1702
    • Eccleston, W.1
  • 11
    • 0032186692 scopus 로고    scopus 로고
    • An analytical grain-barrier height model and its characterization for intrinsic poly-Si thin-film transistor
    • Oct
    • H.-L. Chen and C.-Y. Wu, "An analytical grain-barrier height model and its characterization for intrinsic poly-Si thin-film transistor," IEEE Trans. Electron Devices, vol. 45, no. 10, pp. 2245-2247, Oct. 1998.
    • (1998) IEEE Trans. Electron Devices , vol.45 , Issue.10 , pp. 2245-2247
    • Chen, H.-L.1    Wu, C.-Y.2
  • 12
    • 0020089602 scopus 로고
    • Conductivity behavior in polycrystalline semiconductor thin film transistors
    • Feb
    • J. Levinson, F. R. Shepherd, P. Scanlon, W. D. Westwood, G. Este, and M. Rider, "Conductivity behavior in polycrystalline semiconductor thin film transistors," J. Appl. Phys., vol. 53, no. 2, pp. 1193-1202, Feb. 1982.
    • (1982) J. Appl. Phys , vol.53 , Issue.2 , pp. 1193-1202
    • Levinson, J.1    Shepherd, F.R.2    Scanlon, P.3    Westwood, W.D.4    Este, G.5    Rider, M.6
  • 13
    • 0016597193 scopus 로고
    • The electrical properties of polycrystalline silicon films
    • Dec
    • J. Y. W. Seto, "The electrical properties of polycrystalline silicon films," J. Appl. Phys., vol. 46, no. 12, pp. 5247-5254, Dec. 1975.
    • (1975) J. Appl. Phys , vol.46 , Issue.12 , pp. 5247-5254
    • Seto, J.Y.W.1
  • 14
    • 0019048875 scopus 로고
    • Electron mobility in inversion and accumulation layers on thermally oxidized silicon surfaces
    • Aug
    • S. C. Sun and J. D. Plummer, "Electron mobility in inversion and accumulation layers on thermally oxidized silicon surfaces," IEEE Trans. Electron Devices, vol. ED-27, no. 8, pp. 1497-1508, Aug. 1980.
    • (1980) IEEE Trans. Electron Devices , vol.ED-27 , Issue.8 , pp. 1497-1508
    • Sun, S.C.1    Plummer, J.D.2
  • 16
    • 0036536114 scopus 로고    scopus 로고
    • Evaluation of grain boundary trap states in polycrystalline silicon thin-film transistors by mobility and capacitance measurements
    • Apr
    • H. Ikeda, "Evaluation of grain boundary trap states in polycrystalline silicon thin-film transistors by mobility and capacitance measurements," J. Appl. Phys., vol. 91, no. 7, pp. 4637-4645, Apr. 2002.
    • (2002) J. Appl. Phys , vol.91 , Issue.7 , pp. 4637-4645
    • Ikeda, H.1
  • 17
    • 0024627772 scopus 로고
    • Effects of trap-state density reduction by plasma hydrogenation in low-temperature polysilicon TFT
    • Mar
    • I.-W. Wu, A. G. Lewis, T.-Y. Huang, and A. Chiang, "Effects of trap-state density reduction by plasma hydrogenation in low-temperature polysilicon TFT," IEEE Electron Device Lett., vol. 10, no. 3, pp. 123-125, Mar. 1989.
    • (1989) IEEE Electron Device Lett , vol.10 , Issue.3 , pp. 123-125
    • Wu, I.-W.1    Lewis, A.G.2    Huang, T.-Y.3    Chiang, A.4
  • 18
    • 33744786002 scopus 로고    scopus 로고
    • Analytical I-V relationship incorporating field-dependent mobility for a symmetrical DG MOSFET with an undoped body
    • Jun
    • M. Wong and X. Shi, "Analytical I-V relationship incorporating field-dependent mobility for a symmetrical DG MOSFET with an undoped body," IEEE Trans. Electron Devices, vol. 53, no. 6, pp. 1389-1397, Jun. 2006.
    • (2006) IEEE Trans. Electron Devices , vol.53 , Issue.6 , pp. 1389-1397
    • Wong, M.1    Shi, X.2
  • 19
    • 0023401686 scopus 로고
    • BSIM: Berkeley short-channel IGFET model for MOS transistors
    • Aug
    • B. J. Sheu, D. L. Scharfetter, P.-K. Ko, and M.-C. Jeng, "BSIM: Berkeley short-channel IGFET model for MOS transistors," IEEE J. Solid-State Circuits, vol. SSC-22, no. 4, pp. 558-566, Aug. 1987.
    • (1987) IEEE J. Solid-State Circuits , vol.SSC-22 , Issue.4 , pp. 558-566
    • Sheu, B.J.1    Scharfetter, D.L.2    Ko, P.-K.3    Jeng, M.-C.4
  • 20
    • 0034318884 scopus 로고    scopus 로고
    • The effects of high temperature annealing on metal-induced laterally crystallized polycrystalline silicon
    • Nov
    • M. Wang, Z. Meng, and M. Wong, "The effects of high temperature annealing on metal-induced laterally crystallized polycrystalline silicon," IEEE Trans. Electron Devices, vol. 47, no. 11, pp. 2061-2067, Nov. 2000.
    • (2000) IEEE Trans. Electron Devices , vol.47 , Issue.11 , pp. 2061-2067
    • Wang, M.1    Meng, Z.2    Wong, M.3
  • 21
    • 33748302978 scopus 로고    scopus 로고
    • Polycrystalline silicon films and thin-film transistors using solution-based metal-induced crystallization
    • Sep
    • Z. Meng, S. Zhao, C. Wu, B. Zhang, M. Wong, and H. S. Kwok, "Polycrystalline silicon films and thin-film transistors using solution-based metal-induced crystallization," J. Display Technol. vol. 2, no. 3, pp. 265-273, Sep. 2006.
    • (2006) J. Display Technol , vol.2 , Issue.3 , pp. 265-273
    • Meng, Z.1    Zhao, S.2    Wu, C.3    Zhang, B.4    Wong, M.5    Kwok, H.S.6
  • 22
    • 0022688857 scopus 로고
    • Inversion-layer capacitance and mobility of very thin gate-oxide MOSFETs
    • Mar
    • M.-S. Liang, J. Y. Choi, P.-K. Ko, and C. Hu, "Inversion-layer capacitance and mobility of very thin gate-oxide MOSFETs," IEEE Trans. Electron Devices, vol. ED-33, no. 3, pp. 409-413, Mar. 1986.
    • (1986) IEEE Trans. Electron Devices , vol.ED-33 , Issue.3 , pp. 409-413
    • Liang, M.-S.1    Choi, J.Y.2    Ko, P.-K.3    Hu, C.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.