Fabrication and electrical characterization of a MOS memory device containing self-assembled metallic nanoparticles

Physica E: Low-Dimensional Systems and Nanostructures

Volumn 38, Issue 1-2, 2007, Pages 85-88

  Sargentis, Ch ^a   Giannakopoulos, K ^b   Travlos, A ^b   Tsamakis, D ^a  

^a NATIONAL TECHNICAL UNIVERSITY OF ATHENS   (Greece)

^b INSTITUTE OF MATERIALS SCIENCE   (Greece)

Author keywords

High k dielectric; Memory devices; Metallic; Nanocrystals; Nanoparticles

Indexed keywords

DATA STORAGE EQUIPMENT; ELECTRIC PROPERTIES; GATES (TRANSISTOR); GOLD; NANOPARTICLES; SELF ASSEMBLY;

CAPACITANCE VOLTAGE MEASUREMENTS; CONDUCTANCE VOLTAGE MEASUREMENTS; NONVOLATILE MEMORIES; VOLTAGE MEMORY DEVICES;

MOS DEVICES;

EID: 34147176588     PISSN: 13869477     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.physe.2006.12.024     Document Type: Article

References (15)

1. Tiwari S., Wahl J.A., Silva H., Rana F., and Welse J.J. Appl. Phys. A 71 (2000) 403
2. Xiaoli Y., Yi S., Shulin G., Jianmin Z., Youdou Z., Kenichi S., Hiroki I., and Toshiro H. Physica E (2000) 189
3. Porti M., Avidano M., Nafria M., Aymerich X., Carreras J., and Garrido B. Microelectron. Eng. 80 (2005) 268
4. Yoon T.-S., Kwon J.-Y., Lee D.-H., Kim K.-B., Min S.-H., Chae D.-H., Kim D.H., Lee J.D., Park B.-G., and Lee H.J. J. Appl. Phys. 87 5 (2000) 2449
5. Seifarth H., Grötzschel R., Markwitz A., Matz W., Nitzsche P., and Rebohle L. Thin Solid Films 330 (1998) 202
6. Liu W.L., Lee P.F., Dai J.Y., Wang J., Chan H.L.W., Choy C.L., Song Z.T., and Feng S.L. Appl. Phys. Lett. 86 (2005) 13110
7. Kanjilal A., Lundsgaard Hansen J., Gaiduk P., Nylandsted Larsen A., Cherkashin N., Claverie A., Normand P., Kapetanakis E., Skarlatos, and Tsoukalas D. Appl. Phys. Lett. 82 8 (2003) 1212
8. Liu Z., Lee Ch., Narayanan V., Pei G., and Kan E.C. IEEE Trans. Electron Devices 49 9 (2002) 1606
9. Tan Z., Samanta S.K., Yoo W.J., and Lee S. Appl. Phys. Lett. 86 1 (2005) 01310714
10. Wang Q., Song Z.T., Liu W.L., Lin C.L., and Wang T.H. Appl. Surf. Sci. 230 (2004) 8
11. Gusev E.P., Cartier E., Buchanan D.A., Gribelyuk M., Copel M., Okorn-Schmidt H., and D`Emic C. Microelectron. Eng. 59 (2001) 341
12. Renault O., Samour D., Rouchon D., Holliger Ph., Papon A.-M., Blin D., and Marthon S. Thin Solid Films 428 (2003) 190
13. Lee J.J., Wang X., Bai W., Lu N., and Kwong D.L. IEEE Trans. Electron Devices 5 10 (2003) 2067
14. Sargentis Ch., Giannakopoulos K., Travlos A., Boukos N., and Tsamakis D. Appl. Phys. Lett. 88 (2006) 073106
15. Huang S., Banerjee S., Tung R.T., and Oda S. J. Appl. Phys. 93 1 (2003) 576