Reverse-contact UV nanoimprint lithography for multilayered structure fabrication

Nanotechnology

Volumn 18, Issue 17, 2007, Pages

  Kehagias, N ^a   Reboud, V ^a   Chansin, G ^a   Zelsmann, M ^b   Jeppesen, C ^c   Schuster, C ^d   Kubenz, M ^d   Reuther, F ^d   Gruetzner, G ^d   Sotomayor Torres, C M ^a  

^a UNIVERSITY COLLEGE CORK   (Ireland)

^b CEA LETI   (France)

^c TECHNICAL UNIVERSITY OF DENMARK   (Denmark)

^d MICRO RESIST TECHNOLOGY GMBH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CROSSLINKING; ETCHING; POLYMER FILMS;

DEVELOPER SOLUTION; PATTERN TRANSFER; RESIDUAL LAYERS; THIN POLYMER FILMS;

NANOIMPRINT LITHOGRAPHY;

POLYMER;

ARTICLE; NANOFABRICATION; PRESSURE; PRIORITY JOURNAL; REVERSE CONTACT ULTRAVIOLET NANOIMPRINT LITHOGRAPHY; SEPARATION TECHNIQUE; TEMPERATURE;

CROSS LINKING; ETCHING; LITHOGRAPHY; POLYMERS;

EID: 34047270113     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/18/17/175303     Document Type: Article

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