Integrated multi-electron-beam blanker array for sub-10-nm electron beam induced deposition

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 24, Issue 6, 2006, Pages 2857-2860

  Zhang, Yanxia ^a   Heerkens, C T H ^a   Van Bruggen, M J ^a   Kruit, P ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ARRAYS; CONTAMINATION; IMAGE ANALYSIS; LENSES; THROUGHPUT;

CURRENT LIMITING APERTURE ARRAYS; ELECTRON BEAM INDUCED DEPOSITION; INTEGRATED MULTI ELECTRON BEAM BLANKER ARRAYS; VIRTUAL SOURCE IMAGES;

ELECTRON BEAMS;

EID: 33845255578     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2366677     Document Type: Article

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