Crystal structure and band gap determination of Hf O2 thin films

Journal of Applied Physics

Volumn 101, Issue 5, 2007, Pages

  Cheynet, Marie C ^a   Pokrant, Simone ^b   Tichelaar, Frans D ^c,d   Rouvìre, Jean Luc ^e  

^a UNIV GRENOBLE ALPES   (France)

^b NXP SEMICONDUCTORS   (Netherlands)

^c DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

^d DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

^e CEA GRENOBLE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTAL STRUCTURE; ENERGY GAP; HAFNIUM COMPOUNDS; HIGH RESOLUTION ELECTRON MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY;

NANOCRYSTALLIZED ORTHORHOMBIC STRUCTURE; VALENCE ELECTRON ENERGY LOSS SPECTROSCOPY (VEELS);

THIN FILMS;

EID: 33947322358     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2697551     Document Type: Article

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