XPS study of TiOx thin films prepared by d.c. magnetron sputtering in Ar-O2 gas mixtures

Surface and Interface Analysis

Volumn 30, Issue 1, 2000, Pages 527-530

  Gouttebaron, R ^a   Cornelissen, D ^a   Snyders, R ^a   Dauchot, J P ^a   Wautelet, M ^a   Hecq, M ^a  

^a UNIVERSITY OF MONS   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION EFFECTS; FILM PREPARATION; GLASS; MAGNETRON SPUTTERING; MASS SPECTROMETRY; PARTIAL PRESSURE; SPUTTER DEPOSITION; SUBSTRATES; THIN FILMS; VACUUM TECHNOLOGY; X RAY PHOTOELECTRON SPECTROSCOPY;

GLOW DISCHARGE MASS SPECTROMETRY; REACTIVE SPUTTERING;

TITANIUM DIOXIDE;

EID: 0034245031     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/1096-9918(200008)30:1<527::AID-SIA834>3.0.CO;2-Z     Document Type: Article

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